Inventor · disambiguated record
Jong Keun Park
Also filed as: PARK JONG · PARK JONG KEUN
47 granted patents·20 pending applications·570 citations·filing 2002–2024
97Inventor score
Files withROHM & HAAS ELECT MAT37DOW GLOBAL TECHNOLOGIES LLC13BAE YOUNG CHEOL6MICRON TECHNOLOGY INC2UNIV ILLINOIS2
Top patents by PatentIndex Score
67 records- 0199US9455177B1Contact hole formation methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Sep 27, 2016·423 cites·10 claims
- 0295US8975001B2Photoresist compositions and methods of forming photolithographic patternsBAE YOUNG CHEOL·Filed 2012·Granted Mar 10, 2015·12 cites·19 claims
- 0395US8790867B2Methods of forming photolithographic patterns by negative tone developmentROHM & HAAS ELECT MAT·Filed 2012·Granted Jul 29, 2014·17 cites·11 claims
- 0494US8697338B2Photolithographic methodsBAE YOUNG CHEOL·Filed 2012·Granted Apr 15, 2014·15 cites·11 claims
- 0591US9464224B2Transformative wavelength conversion mediumROHM & HAAS ELECT MAT·Filed 2014·Granted Oct 11, 2016·9 cites·7 claims
- 0691US8921031B2Photoresist overcoat compositions and methods of forming electronic devicesBAE YOUNG CHEOL·Filed 2012·Granted Dec 30, 2014·9 cites·17 claims
- 0790US9382472B2Transformative wavelength conversion mediumROHM & HAAS ELECT MAT·Filed 2014·Granted Jul 5, 2016·9 cites·5 claims
- 0889US9671697B2Pattern treatment methodsDOW GLOBAL TECHNOLOGIES LLC·Filed 2016·Granted Jun 6, 2017·6 cites·12 claims
- 0988US9448483B2Pattern shrink methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Sep 20, 2016·8 cites·36 claims
- 1087US8614050B2Polymers, photoresist compositions and methods of forming photolithographic patternsBAE YOUNG CHEOL·Filed 2011·Granted Dec 24, 2013·6 cites·14 claims
- 1186US9478713B2Nanostructure material methods and devicesUNIV ILLINOIS·Filed 2015·Granted Oct 25, 2016·3 cites·15 claims
- 1285US9418848B2Methods of forming patterns with a mask formed utilizing a brush layerMICRON TECHNOLOGY INC·Filed 2015·Granted Aug 16, 2016·4 cites·16 claims
- 1385US9184058B2Methods of forming patterns by using a brush layer and masksMICRON TECHNOLOGY INC·Filed 2013·Granted Nov 10, 2015·6 cites·15 claims
- 1484US9458348B2Photoresist overcoat compositions and methods of forming electronic devicesROHM & HAAS ELECT MAT·Filed 2015·Granted Oct 4, 2016·3 cites·16 claims
- 1581US9916973B2Photolithographic methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Mar 13, 2018·3 cites·10 claims
- 1681US9869933B2Pattern trimming methodsROHM & HAAS ELECT MAT·Filed 2016·Granted Jan 16, 2018·3 cites·12 claims
- 1781US9684241B2Compositions and methods for pattern treatmentDOW GLOBAL TECHNOLOGIES LLC·Filed 2016·Granted Jun 20, 2017·3 cites·11 claims
- 1881US9665005B2Pattern treatment methodsDOW GLOBAL TECHNOLOGIES LLC·Filed 2016·Granted May 30, 2017·3 cites·12 claims
- 1981US9508549B2Methods of forming electronic devices including filling porous features with a polymerROHM & HAAS ELECT MAT·Filed 2015·Granted Nov 29, 2016·3 cites·12 claims
- 2081US9209067B2Gap-fill methodsROHM & HAAS ELECT MAT·Filed 2014·Granted Dec 8, 2015·5 cites·10 claims
- 2180US9128379B2Photolithographic methodsROHM & HAAS ELECT MAT·Filed 2014·Granted Sep 8, 2015·3 cites·11 claims
- 2277US10162265B2Pattern treatment methodsROHM & HAAS ELECT MAT·Filed 2016·Granted Dec 25, 2018·2 cites·10 claims
- 2377US9828518B2Copolymer formulations, methods of manufacture thereof and articles comprising the sameDOW GLOBAL TECHNOLOGIES LLC·Filed 2014·Granted Nov 28, 2017·3 cites·6 claims
- 2476US9703203B2Compositions and methods for pattern treatmentDOW GLOBAL TECHNOLOGIES LLC·Filed 2016·Granted Jul 11, 2017·2 cites·11 claims
- 2569US9158198B2Photoresist compositions and methods of forming photolithographic patternsROHM & HAAS ELECT MAT·Filed 2013·Granted Oct 13, 2015·1 cites·18 claims
- 2668US10133179B2Pattern treatment methodsROHM & HAAS ELECT MAT·Filed 2016·Granted Nov 20, 2018·1 cites·11 claims
- 2768US9760011B1Pattern trimming compositions and methodsROHM & HAAS ELECT MAT·Filed 2016·Granted Sep 12, 2017·1 cites·11 claims
- 2868US8771917B2Monomers, polymers, photoresist compositions and methods of forming photolithographic patternsOBER MATTHIAS S·Filed 2011·Granted Jul 8, 2014·1 cites·20 claims
- 2965US10949026B2Optoelectronic device and methods of useDOW GLOBAL TECHNOLOGIES LLC·Filed 2017·Granted Mar 16, 2021·1 cites·11 claims
- 3065US9581904B2Photoresist overcoat compositionsROHM & HAAS ELECT MAT·Filed 2015·Granted Feb 28, 2017·1 cites·19 claims
- 3164US9490117B2Directed self-assembly pattern formation methods and compositionsROHM & HAAS ELECT MAT·Filed 2014·Granted Nov 8, 2016·1 cites·9 claims
- 3264US9298093B2Polymers, photoresist compositions and methods of forming photolithographic patternsBAE YOUNG CHEOL·Filed 2011·Granted Mar 29, 2016·1 cites·7 claims
- 3360US9212293B2Photoresist overcoat compositions and methods of forming electronic devicesROHM & HAAS ELECT MAT·Filed 2014·Granted Dec 15, 2015·0 cites·18 claims
- 3460US2024184201A1Polymer, photoresist compositions including the same, and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 3559US12228859B2Pattern formation methodsROHM & HAAS ELECT MAT·Filed 2018·Granted Feb 18, 2025·0 cites·11 claims
- 3658US9394411B2Methods for annealing block copolymers and articles manufactured therefromDOW GLOBAL TECHNOLOGIES LLC·Filed 2014·Granted Jul 19, 2016·0 cites·15 claims
- 3758US2023213862A1Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 3858US2024393689A1Compounds, monomers, polymers, photoresist compositions and pattern formation methodsDUPONT ELECTRONIC MAT INTERNATIONAL LLC·Filed 2023·Application pending·0 cites
- 3957US9738814B2Method of controlling block copolymer characteristics and articles manufactured therefromDOW GLOBAL TECHNOLOGIES LLC·Filed 2014·Granted Aug 22, 2017·0 cites·13 claims
- 4055US9459534B2Photolithographic methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Oct 4, 2016·0 cites·18 claims
- 4155US2024377061A1Combined combustion burner and combustion apparatus including sameDOOSAN ENERBILITY CO LTD·Filed 2024·Application pending·0 cites
- 4255US2024019779A1Compounds and photoresist compositions including the sameROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 4354US12085854B2Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2021·Granted Sep 10, 2024·0 cites·18 claims
- 4453US2023314934A1Photoactive compounds, photoresist compositions including the same, and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 4553US2023103685A1Iodine-containing acid cleavable compounds, polymers derived therefrom, and photoresist compositionsROHM & HAAS ELECT MAT·Filed 2021·Application pending·0 cites
- 4653US2020356001A1Photoresist compositions and methods of forming resist patterns with such compositionsROHM & HAAS ELECT MAT·Filed 2019·Application pending·0 cites
- 4751US9482945B2Photoresist compositions and methods of forming photolithographic patternsROHM & HAAS ELECT MAT·Filed 2015·Granted Nov 1, 2016·0 cites·7 claims
- 4849US9927556B2Nanostructure material methods and devicesUNIV ILLINOIS·Filed 2016·Granted Mar 27, 2018·0 cites·17 claims
- 4948US2016124309A1Pattern formation methodsROHM & HAAS ELECT MAT·Filed 2015·Application pending·0 cites
- 5048US2021200084A1Polymers and photoresist compositionsROHM & HAAS ELECT MAT·Filed 2019·Application pending·0 cites
Showing the top 50 of 67 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Jong Keun Park files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →