Inventor · disambiguated record
Joon-Bum Shim
Also filed as: SHIM JOON · SHIM JOON B · SHIM JOON-BUM
7 granted patents·5 pending applications·44 citations·filing 2003–2007
81Inventor score
Files withDONGBU ELECTRONICS CO LTD6DONGBUANAM SEMICONDUCTOR INC2BI XIAOLI1COMPUMED INC1SHIM JOON B1
Top patents by PatentIndex Score
12 records- 0171US7280683B2Method, code, and system for assaying joint deformityCOMPUMED INC·Filed 2003·Granted Oct 9, 2007·29 cites·27 claims
- 0259US7375028B2Method for manufacturing a semiconductor deviceDONGBU ELECTRONICS CO LTD·Filed 2005·Granted May 20, 2008·1 cites·19 claims
- 0350US7326645B2Methods for forming copper interconnect of semiconductor devicesDONGBU ELECTRONICS CO LTD·Filed 2004·Granted Feb 5, 2008·5 cites·18 claims
- 0449US7186649B2Submicron semiconductor device and a fabricating method thereofDONGBU ELECTRONICS CO LTD·Filed 2003·Granted Mar 6, 2007·4 cites·5 claims
- 0548US7232746B2Method for forming dual damascene interconnection in semiconductor deviceDONGBU ELECTRONICS CO LTD·Filed 2004·Granted Jun 19, 2007·4 cites·12 claims
- 0644US7312157B2Methods and apparatus for cleaning semiconductor devicesDONGBU ELECTRONICS CO LTD·Filed 2004·Granted Dec 25, 2007·1 cites·7 claims
- 0742US2008107322A1Method, code, and system for assaying joint deformityBI XIAOLI·Filed 2007·Application pending·0 cites
- 0840US7595265B2Semiconductor device and method for forming a metal line in the semiconductor deviceDONGBU ELECTRONICS CO LTD·Filed 2005·Granted Sep 29, 2009·0 cites·15 claims
- 0939US2006063308A1Method for cleaning semiconductor device having dual damascene structureDONGBUANAM SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 1038US2006046465A1Method for manufacturing a semiconductor deviceDONGBUANAM SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 1137US2006160301A1Method for fabricating a metal-insulator-metal capacitorSHIM JOON B·Filed 2005·Application pending·0 cites
- 1235US2005064688A1Methods for fabricating semiconductor devicesFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →