Inventor · disambiguated record
Jorg Thiele
Also filed as: THIELE JOERG · THIELE JORG
7 granted patents·4 pending applications·211 citations·filing 1999–2006
83Inventor score
Files withINFINEON TECHNOLOGIES AG6INFINEON TECHNOLGIES AG1KOHLE RODERICK1MOSLER SEBASTIAN1SIEMENS AG1
Top patents by PatentIndex Score
11 records- 0190US6745380B2Method for optimizing and method for producing a layout for a mask, preferably for use in semiconductor production, and computer program thereforINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jun 1, 2004·188 cites·27 claims
- 0261US6692875B2Mask for optical projection systems, and a process for its productionINFINEON TECHNOLOGIES AG·Filed 2001·Granted Feb 17, 2004·7 cites·14 claims
- 0359US7393613B2Set of at least two masks for the projection of structure patternsINFINEON TECHNOLOGIES AG·Filed 2004·Granted Jul 1, 2008·7 cites·5 claims
- 0459US6493865B2Method of producing masks for fabricating semiconductor structuresINFINEON TECHNOLOGIES AG·Filed 2001·Granted Dec 10, 2002·6 cites·12 claims
- 0550US7393614B2Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2004·Granted Jul 1, 2008·3 cites·9 claims
- 0638US2006190850A1Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomaskKOHLE RODERICK·Filed 2006·Application pending·0 cites
- 0738US2005196686A1Method for compensation of the shortening of line ends during the formation of lines on a waferFiled 2005·Application pending·0 cites
- 0836US7354683B2Lithography mask for imaging of convex structuresINFINEON TECHNOLOGIES AG·Filed 2004·Granted Apr 8, 2008·0 cites·30 claims
- 0933US2005120326A1Method for producing for a mask a mask layout which avoids aberrationsINFINEON TECHNOLGIES AG·Filed 2004·Application pending·0 cites
- 1032US2008042171A1Transistor arrangement, sense-amplifier arrangement and methods of manufacturing the same via a phase shift maskMOSLER SEBASTIAN·Filed 2006·Application pending·0 cites
- 1120US6562664B1Method for installing protective components in integrated circuits that are constructed from standard cellsSIEMENS AG·Filed 1999·Granted May 13, 2003·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →