Inventor · disambiguated record
John Whitman
Also filed as: WHITMAN JOHN · WHITMAN JOHN D
10 granted patents·4 pending applications·105 citations·filing 1997–2006
89Inventor score
Top patents by PatentIndex Score
14 records- 0177US6758908B2Solvent prewet and method and apparatus to dispense the solvent prewetMICRON TECHNOLOGY INC·Filed 2001·Granted Jul 6, 2004·15 cites·8 claims
- 0276US6284676B1Solvent prewet and method and apparatus to dispense the solvent prewetMICRON TECHNOLOGY INC·Filed 2000·Granted Sep 4, 2001·13 cites·29 claims
- 0376US6147010ASolvent prewet and method to dispense the solvent prewetMICRON TECHNOLOGY INC·Filed 1997·Granted Nov 14, 2000·37 cites·7 claims
- 0475US6884462B2Solvent prewet and method to dispense the solvent prewetMICRON TECHNOLOGY INC·Filed 2004·Granted Apr 26, 2005·12 cites·48 claims
- 0558US6642155B1Method for applying a fluid to a rotating silicon wafer surfaceMICRON TECHNOLOGY INC·Filed 1998·Granted Nov 4, 2003·20 cites·4 claims
- 0651US6579471B2Solvent prewet and method and apparatus to dispense the solvent prewetMICRON TECHNOLOGY INC·Filed 2001·Granted Jun 17, 2003·2 cites·10 claims
- 0749US2005194661A1Solvent prewet and method to dispense the solvent prewetMICRON TECHNOLOGY INC·Filed 2005·Application pending·0 cites
- 0849US2007004221A1Methods for forming material layers with substantially planar surfaces on semiconductor device structuresWHITMAN JOHN·Filed 2006·Application pending·0 cites
- 0949US2007004219A1Semiconductor device fabrication methods employing substantially planar buffer material layers to improve the planarity of subsequent planarazation processesWHITMAN JOHN·Filed 2006·Application pending·0 cites
- 1045US7202138B2Spin coating for maximum fill characteristic yielding a planarized thin film surfaceMICRON TECHNOLOGY INC·Filed 2001·Granted Apr 10, 2007·1 cites·35 claims
- 1139US7101771B2Spin coating for maximum fill characteristic yielding a planarized thin film surfaceMICRON TECHNOLOGY INC·Filed 2001·Granted Sep 5, 2006·0 cites·22 claims
- 1237US2002005539A1Spin coating for maximum fill characteristic yielding a planarized thin film surfaceFiled 2001·Application pending·0 cites
- 1334US5968710AControlled removal of electron beam curable coatings and articles formed therebyMICRON TECHNOLOGY INC·Filed 1998·Granted Oct 19, 1999·5 cites·30 claims
- 1428US6893504B1Multi-port chemical dispenseMICRON TECHNOLOGY INC·Filed 1999·Granted May 17, 2005·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →