Inventor · disambiguated record
Jung Wun Hwang
Also filed as: HWANG JUNG WUN
2 granted patents·8 pending applications·1 citations·filing 2018–2024
31Inventor score
Top patents by PatentIndex Score
10 records- 0179US11581144B2Multilayer capacitor and board having the same mounted thereonSAMSUNG ELECTRO MECH·Filed 2021·Granted Feb 14, 2023·1 cites·18 claims
- 0263US2025166904A1Multilayer electronic componentSAMSUNG ELECTRO MECH·Filed 2024·Application pending·0 cites
- 0355US2025104922A1Multilayer electronic component and method for manufacturing the sameSAMSUNG ELECTRO MECH·Filed 2024·Application pending·0 cites
- 0453US2025166897A1Multilayer electronic componentSAMSUNG ELECTRO MECH·Filed 2024·Application pending·0 cites
- 0553US2025210258A1Multilayer electronic componentSAMSUNG ELECTRO MECH·Filed 2024·Application pending·0 cites
- 0652US2025104923A1Multilayer electronic componentSAMSUNG ELECTRO MECH·Filed 2024·Application pending·0 cites
- 0751US2025079087A1Multilayer electronic componentSAMSUNG ELECTRO MECH·Filed 2024·Application pending·0 cites
- 0850US2025218689A1Multilayer electronic componentSAMSUNG ELECTRO MECH·Filed 2024·Application pending·0 cites
- 0949US2025218669A1Multilayer electronic componentSAMSUNG ELECTRO MECH·Filed 2024·Application pending·0 cites
- 1044US11472821B2Precursor compounds for atomic layer deposition (ALD) and chemical vapor deposition (CVD) and ALD/CVD process using the sameHANSOL CHEMICAL CO LTD·Filed 2018·Granted Oct 18, 2022·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →