Inventor · disambiguated record
Junichiro Iba
Also filed as: IBA JUNICHIRO
12 granted patents·1 pending application·401 citations·filing 1995–2002
93Inventor score
Files withTOSHIBA KK13
Top patents by PatentIndex Score
13 records- 0190US6011611AMethod of measuring aberration of projection opticsTOSHIBA KK·Filed 1998·Granted Jan 4, 2000·84 cites·19 claims
- 0289US6100132AMethod of deforming a trench by a thermal treatmentTOSHIBA KK·Filed 1998·Granted Aug 8, 2000·72 cites·10 claims
- 0389US5883006AMethod for making a semiconductor device using a flowable oxide filmTOSHIBA KK·Filed 1997·Granted Mar 16, 1999·111 cites·22 claims
- 0481US6600189B1Semiconductor device and semiconductor device manufacturing methodTOSHIBA KK·Filed 2000·Granted Jul 29, 2003·25 cites·4 claims
- 0575US6107135AMethod of making a semiconductor memory device having a buried plate electrodeTOSHIBA KK·Filed 1998·Granted Aug 22, 2000·32 cites·14 claims
- 0667US6534814B2Method of manufacturing a semiconductor memory device having a trench capacitor with sufficient capacitance and small junction leak currentTOSHIBA KK·Filed 2000·Granted Mar 18, 2003·9 cites·25 claims
- 0761US6288556B1Method of electrical measurement of misregistration of patternsTOSHIBA KK·Filed 1998·Granted Sep 11, 2001·26 cites·6 claims
- 0855US6100130AMethod of manufacturing a semiconductor memory device having a trench capacitorTOSHIBA KK·Filed 1997·Granted Aug 8, 2000·11 cites·5 claims
- 0950US6440644B1Planarization method and system using variable exposureTOSHIBA KK·Filed 1999·Granted Aug 27, 2002·11 cites·14 claims
- 1049US5715040AIllumination aperture of low intensity lossTOSHIBA KK·Filed 1995·Granted Feb 3, 1998·11 cites·15 claims
- 1139US2003045327A1Storage deviceTOSHIBA KK·Filed 2002·Application pending·0 cites
- 1237US6064466APlanarization method and system using variable exposureTOSHIBA KK·Filed 1997·Granted May 16, 2000·6 cites·29 claims
- 1333US6313535B1Wiring layer of a semiconductor integrated circuitTOSHIBA KK·Filed 1999·Granted Nov 6, 2001·3 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →