Inventor · disambiguated record
Jung-Dae Park
Also filed as: PARK JUNG DAE
13 granted patents·8 pending applications·46 citations·filing 1997–2018
88Inventor score
Top patents by PatentIndex Score
21 records- 0191US7951653B1Methods of manufacturing a semiconductor device using compositions for etching copperSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted May 31, 2011·15 cites·13 claims
- 0284US7351667B2Etching solution for silicon oxide method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 1, 2008·10 cites·10 claims
- 0383US10495615B2Evaluation systems of block copolymer patternsSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Dec 3, 2019·2 cites·9 claims
- 0482US7943562B2Semiconductor substrate cleaning methods, and methods of manufacture using sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted May 17, 2011·9 cites·20 claims
- 0574US7985297B2Method of cleaning a quartz partSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Jul 26, 2011·3 cites·19 claims
- 0673US8043974B2Semiconductor wet etchant and method of forming interconnection structure using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Oct 25, 2011·4 cites·16 claims
- 0766US7678751B2Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Mar 16, 2010·1 cites·39 claims
- 0863US7687448B2Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Mar 30, 2010·0 cites·14 claims
- 0962US9528949B2Methods of detecting inhomogeneity of a layer and apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Dec 27, 2016·1 cites·17 claims
- 1061US10790176B2Substrate carrierSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Sep 29, 2020·1 cites·20 claims
- 1156US7608540B2Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 27, 2009·0 cites·18 claims
- 1255US2008194037A1Apparatus and methods for detecting metal concentration in an atmosphereSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1353US7795198B2Composition for removing a polymeric contaminant and method of removing a polymeric contaminant using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 14, 2010·0 cites·6 claims
- 1451US2011123400A1Apparatus for detecting metal concentration in an atmosphereHONG HYUN-KEE·Filed 2011·Application pending·0 cites
- 1545US2012009792A1Semiconductor wet etchant and method of forming interconnection structure using the samePARK JUNG-DAE·Filed 2011·Application pending·0 cites
- 1644US2012183696A1Plating method using analysis photoresist residue in plating solutionPARK JUNG-DAE·Filed 2011·Application pending·0 cites
- 1741US2018045697A1Thermal desorption system and method of analyzing a substrate using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
- 1838US2007037400A1Composition and methods removing polysiliconHWANG DONG-WON·Filed 2006·Application pending·0 cites
- 1936US2008000502A1Compositions for cleaning a probe card and methods of cleaning a probe card using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2033US2007000523A1Cleaning composition and related methodsKIM SE-YEON·Filed 2006·Application pending·0 cites
- 2119US6107730AProcess for manufacturing a frame for color picture tubesSAMSUNG DISPLAY DEVICES CO LTD·Filed 1997·Granted Aug 22, 2000·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →