Inventor · disambiguated record
Jun-Youl Yang
Also filed as: YANG JUN-YOUL
10 granted patents·3 pending applications·47 citations·filing 2009–2024
86Inventor score
Top patents by PatentIndex Score
13 records- 0191US8552489B2Vertical channel memory devices with nonuniform gate electrodesEOM DAEHONG·Filed 2012·Granted Oct 8, 2013·20 cites·5 claims
- 0285US9530670B2Methods of forming conductive patterns and methods of manufacturing semiconductor devices using the same using an etchant composition that includes phosphoric acid, nitric acid, and an assistant oxidantSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Dec 27, 2016·8 cites·14 claims
- 0381US10580617B2Method and apparatus for plasma etchingSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Mar 3, 2020·2 cites·8 claims
- 0481US8685821B2Vertical channel memory devices with nonuniform gate electrodes and methods of fabricating the sameEOM DAEHONG·Filed 2013·Granted Apr 1, 2014·6 cites·15 claims
- 0579US8168509B2Etching methods and methods of manufacturing a CMOS image sensor using the sameKO KI-HYUNG·Filed 2010·Granted May 1, 2012·4 cites·16 claims
- 0671US10910237B2Operating method for wet etching system and related systemSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Feb 2, 2021·1 cites·20 claims
- 0768US8963231B2Three dimensional semiconductor memory devices and methods of fabricating the sameLEE SUNGHAE·Filed 2012·Granted Feb 24, 2015·2 cites·30 claims
- 0868US8765551B2Non-volatile memory device having vertical structure and method of manufacturing the sameYANG JUN-YOUL·Filed 2012·Granted Jul 1, 2014·4 cites·21 claims
- 0962US2025239466A1Wafer cleaning systemSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1054US10096453B2Method and apparatus for plasma etchingSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Oct 9, 2018·0 cites·7 claims
- 1149US9972638B2Methods of fabricating three-dimensional semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted May 15, 2018·0 cites·27 claims
- 1248US2010178754A1Method of manufacturing cmos transistorSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 1337US2013183824A1Method of fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →