Inventor · disambiguated record
Kazushi Asami
Also filed as: ASAMI KAZUSHI
18 granted patents·2 pending applications·373 citations·filing 1994–2015
95Inventor score
Top patents by PatentIndex Score
20 records- 0193US6287885B1Method for manufacturing semiconductor dynamic quantity sensorDENSO CORP·Filed 1999·Granted Sep 11, 2001·84 cites·38 claims
- 0290US7418864B2Acceleration sensor and method for manufacturing the sameDENSO CORP·Filed 2006·Granted Sep 2, 2008·25 cites·10 claims
- 0389US6580600B2Capacitance type humidity sensor and manufacturing method of the sameNIPPON SOKEN·Filed 2002·Granted Jun 17, 2003·41 cites·24 claims
- 0480US7900512B2Angular rate sensorDENSO CORP·Filed 2007·Granted Mar 8, 2011·13 cites·29 claims
- 0580US6119518AAngular velocity sensorNIPPON SOKEN·Filed 1997·Granted Sep 19, 2000·84 cites·14 claims
- 0677US8461052B2Semiconductor device manufacturing methodOOHARA JUNJI·Filed 2011·Granted Jun 11, 2013·6 cites·12 claims
- 0777US7214625B2Method for manufacturing movable portion of semiconductor deviceDENSO CORP·Filed 2004·Granted May 8, 2007·22 cites·56 claims
- 0875US6549015B2Pair of electrodes for detecting acidity or basicity of oilDENSO CORP·Filed 2000·Granted Apr 15, 2003·13 cites·6 claims
- 0968US7105902B2Optical device having movable portion and method for manufacturing the sameDENSO CORP·Filed 2004·Granted Sep 12, 2006·11 cites·14 claims
- 1062US8256289B2Angular rate sensorKANO KAZUHIKO·Filed 2010·Granted Sep 4, 2012·3 cites·15 claims
- 1162US6718824B2Semiconductor dynamic quantity detecting sensor and manufacturing method of the sameNIPPON SOKEN·Filed 2001·Granted Apr 13, 2004·9 cites·13 claims
- 1261US6010919AMethod for manufacturing semiconductor devices by use of dry etchingNIPPON SOKEN·Filed 1997·Granted Jan 4, 2000·27 cites·26 claims
- 1359US8471363B2Semiconductor device and method of manufacturing the sameASAMI KAZUSHI·Filed 2011·Granted Jun 25, 2013·2 cites·8 claims
- 1456US8610246B2Semiconductor device capable of restricting coil extension direction and manufacturing method thereofYOSHIHARA SHINJI·Filed 2011·Granted Dec 17, 2013·1 cites·4 claims
- 1550US5536364AProcess of plasma etching siliconNIPPON SOKEN·Filed 1994·Granted Jul 16, 1996·19 cites·6 claims
- 1642US2002114125A1Capacitance type humidity sensor and manufacturing method of the sameFiled 2002·Application pending·0 cites
- 1737US5575887APlasma etching method and device manufacturing method therebyNIPPON DENSO CO·Filed 1995·Granted Nov 19, 1996·6 cites·13 claims
- 1837US2011129686A1Deposition method, deposition apparatus, and laminated filmDENSO CORP·Filed 2010·Application pending·0 cites
- 1936US6116087AAngular velocity sensorNIPPON SOKEN·Filed 1998·Granted Sep 12, 2000·7 cites·26 claims
- 2033US10395975B2Semiconductor device and manufacturing method for the sameDENSO CORP·Filed 2015·Granted Aug 27, 2019·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →