Inventor · disambiguated record
Kaolin N. Chiong
Also filed as: CHIONG KAOLIN N
6 granted patents·259 citations·filing 1985–1989
86Inventor score
Files withIBM6
Top patents by PatentIndex Score
6 records- 0194US4613398AFormation of etch-resistant resists through preferential permeationIBM·Filed 1985·Granted Sep 23, 1986·139 cites·30 claims
- 0281US4810601ATop imaged resistsIBM·Filed 1986·Granted Mar 7, 1989·50 cites·28 claims
- 0375US4880722ADiazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developersIBM·Filed 1987·Granted Nov 14, 1989·25 cites·10 claims
- 0466US4980264APhotoresist compositions of controlled dissolution rate in alkaline developersIBM·Filed 1985·Granted Dec 25, 1990·18 cites·8 claims
- 0559US4904564AProcess for imaging multi-layer resist structureIBM·Filed 1988·Granted Feb 27, 1990·14 cites·12 claims
- 0656US4942108AProcess of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developersIBM·Filed 1989·Granted Jul 17, 1990·13 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →