Inventor · disambiguated record
Kazuhiro Enomoto
Also filed as: ENOMOTO KAZUHIRO
14 granted patents·11 pending applications·101 citations·filing 2002–2014
91Inventor score
Top patents by PatentIndex Score
25 records- 0187US7837800B2CMP polishing slurry and polishing methodHITACHI CHEMICAL CO LTD·Filed 2008·Granted Nov 23, 2010·10 cites·8 claims
- 0285US7367870B2Polishing fluid and polishing methodHITACHI CHEMICAL CO LTD·Filed 2003·Granted May 6, 2008·29 cites·19 claims
- 0385US7102264B2Synchronous induction motor and manufacturing method and drive unit for the same, and hermetic electric compressorSANYO ELECTRIC CO·Filed 2004·Granted Sep 5, 2006·22 cites·1 claims
- 0476US7838482B2CMP polishing compound and polishing methodHITACHI CHEMICAL CO LTD·Filed 2004·Granted Nov 23, 2010·15 cites·9 claims
- 0571US8591612B2Cerium oxide slurry, cerium oxide polishing slurry and method for polishing substrate using the sameHITACHI CHEMICAL CO LTD·Filed 2013·Granted Nov 26, 2013·2 cites·16 claims
- 0671US8168541B2CMP polishing slurry and polishing methodFUKASAWA MASATO·Filed 2010·Granted May 1, 2012·2 cites·16 claims
- 0766US7682701B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2005·Granted Mar 23, 2010·4 cites·21 claims
- 0862US7311855B2Polishing slurry for chemical mechanical polishing and method for polishing substrateHITACHI CHEMICAL CO LTD·Filed 2003·Granted Dec 25, 2007·7 cites·6 claims
- 0961US8696929B2Polishing slurry and polishing methodKURATA YASUSHI·Filed 2007·Granted Apr 15, 2014·1 cites·11 claims
- 1060US8231735B2Polishing slurry for chemical mechanical polishing and method for polishing substrateHAGA KOUJI·Filed 2007·Granted Jul 31, 2012·1 cites·5 claims
- 1159US8524111B2CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing methodFUKASAWA MASATO·Filed 2007·Granted Sep 3, 2013·1 cites·30 claims
- 1259US7687590B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2005·Granted Mar 30, 2010·2 cites·39 claims
- 1351US7358300B2Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic partsHITACHI CHEMICAL CO LTD·Filed 2004·Granted Apr 15, 2008·5 cites·13 claims
- 1449US2013059439A1Cmp polishing liquid, method for polishing substrate, and electronic componentHITACHI CHEMICAL CO LTD·Filed 2012·Application pending·0 cites
- 1549US2007093183A1Cerium oxide slurry, cerium oxide polishing slurry and method for polishing substrate using the sameHITACHI CHEMICAL CO LTD·Filed 2006·Application pending·0 cites
- 1649US2016220943A1Carbon-dioxide recovery apparatus, and carbon-dioxide recovery methodHITACHI CHEMICAL CO LTD·Filed 2014·Application pending·0 cites
- 1747US2016199808A1Carbon-dioxide capturing material, and carbon-dioxide recovery apparatus using sameHITACHI CHEMICAL CO LTD·Filed 2014·Application pending·0 cites
- 1845US2012299158A1Cmp polishing liquid, method for polishing substrate, and electronic componentSHINODA TAKASHI·Filed 2010·Application pending·0 cites
- 1943US2007175104A1Polishing slurry for silicon oxide, additive liquid and polishing methodHITACHI CHEMICAL CO LTD·Filed 2006·Application pending·0 cites
- 2041US2004253462A1Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity filmHITACHI CHEMICAL CO LTD·Filed 2004·Application pending·0 cites
- 2141US2007218811A1Cmp polishing slurry and method of polishing substrateHITACHI CHEMICAL CO LTD·Filed 2005·Application pending·0 cites
- 2241US2006199021A1Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity filmNARITA TAKENORI·Filed 2006·Application pending·0 cites
- 2338US2004084984A1Synchronous induction motor and manufacturing method and drive unit for the same, and hermetic electric compressorSANYO ELECTRIC CO·Filed 2003·Application pending·0 cites
- 2437US2002140309A1Synchronous induction motor and manufacturing method and drive unit for the same, and hermetic electric compressorSANYO ELECTRIC CO·Filed 2002·Application pending·0 cites
- 2530US9022834B2Polishing solution for CMP and polishing method using the polishing solutionSATOU EIICHI·Filed 2011·Granted May 5, 2015·0 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →