Inventor · disambiguated record
Kazuhiro Fukada
Also filed as: FUKADA KAZUHIRO
5 granted patents·7 pending applications·65 citations·filing 1997–2023
72Inventor score
Files withSHIBAURA MACHINE CO LTD6JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECH5US OF AMERICA AS RESPRESENTED1
Top patents by PatentIndex Score
12 records- 0176US10784120B2Laminate, etching mask, method of producing laminate, method of producing etching mask, and method of producing thin film transistorJAPAN ADVANCED INSTITUTE OF SCIENCE AND TECH·Filed 2016·Granted Sep 22, 2020·2 cites·13 claims
- 0275US5988875ACalorimeter and method for simultaneous measurement of thermal conductivity and specific heat of fluidsUS OF AMERICA AS RESPRESENTED·Filed 1997·Granted Nov 23, 1999·63 cites·17 claims
- 0363US2025297367A1Method for forming conductive layer-attached resin base materialSHIBAURA MACHINE CO LTD·Filed 2023·Application pending·0 cites
- 0462US11133191B2Method of producing etching mask, etching mask precursor, and oxide layer, and method of manufacturing thin film transistorJAPAN ADVANCED INSTITUTE OF SCIENCE AND TECH·Filed 2019·Granted Sep 28, 2021·0 cites·5 claims
- 0556US2024318303A1Surface treatment apparatusSHIBAURA MACHINE CO LTD·Filed 2022·Application pending·0 cites
- 0655US2025129464A1Surface treatment apparatus and surface treatment methodSHIBAURA MACHINE CO LTD·Filed 2022·Application pending·0 cites
- 0755US2025153134A1Surface treatment apparatusSHIBAURA MACHINE CO LTD·Filed 2023·Application pending·0 cites
- 0851US2025079126A1Surface treatment apparatusSHIBAURA MACHINE CO LTD·Filed 2022·Application pending·0 cites
- 0949US10634996B2Composite member and method of manufacturing the same, and aliphatic polycarbonate-containing layerJAPAN ADVANCED INSTITUTE OF SCIENCE AND TECH·Filed 2016·Granted Apr 28, 2020·0 cites·21 claims
- 1046US10400336B2Oxide precursor, oxide layer, semiconductor element, and electronic device, and method of producing oxide layer and method of producing semiconductor elementJAPAN ADVANCED INSTITUTE OF SCIENCE AND TECH·Filed 2015·Granted Sep 3, 2019·0 cites·20 claims
- 1146US2018096853A1Method of producing etching mask, etching mask precursor, and oxide layer, and method of manufacturing thin film transistorJAPAN ADVANCED INSTITUTE OF SCIENCE AND TECH·Filed 2016·Application pending·0 cites
- 1245US2024060171A1Surface treatment apparatus and surface treatment methodSHIBAURA MACHINE CO LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →