Inventor · disambiguated record
Katsuya Hayano
Also filed as: HAYANO KATSUYA
34 granted patents·5 pending applications·480 citations·filing 1993–2019
97Inventor score
Top patents by PatentIndex Score
39 records- 0190US6329112B1Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lensHITACHI LTD·Filed 1999·Granted Dec 11, 2001·59 cites·13 claims
- 0289US10394118B2Photomask and methods for manufacturing and correcting photomaskDAINIPPON PRINTING CO LTD·Filed 2018·Granted Aug 27, 2019·2 cites·11 claims
- 0388US5895741APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1997·Granted Apr 20, 1999·59 cites·27 claims
- 0487US10048580B2Photomask and methods for manufacturing and correcting photomaskDAINIPPON PRINTING CO LTD·Filed 2016·Granted Aug 14, 2018·2 cites·8 claims
- 0587US8974987B2Photomask and methods for manufacturing and correcting photomaskNAGAI TAKAHARU·Filed 2010·Granted Mar 10, 2015·7 cites·12 claims
- 0687US5429896APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1993·Granted Jul 4, 1995·58 cites·20 claims
- 0786US7736985B2Method for manufacturing semiconductor device using overlapping exposure and semiconductor device thereofHITACHI LTD·Filed 2007·Granted Jun 15, 2010·13 cites·15 claims
- 0886US6548312B1Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methodsHITACHI LTD·Filed 2000·Granted Apr 15, 2003·31 cites·31 claims
- 0985US9519211B2Photomask and methods for manufacturing and correcting photomaskDAINIPPON PRINTING CO LTD·Filed 2015·Granted Dec 13, 2016·2 cites·8 claims
- 1085US6713231B1Method of manufacturing semiconductor integrated circuit devicesRENESAS TECH CORP·Filed 2000·Granted Mar 30, 2004·27 cites·27 claims
- 1181US7252910B2Fabrication method of semiconductor integrated circuit device and mask fabrication methodDAINIPPON PRINTING CO LTD·Filed 2004·Granted Aug 7, 2007·19 cites·21 claims
- 1281US5700601APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1995·Granted Dec 23, 1997·40 cites·22 claims
- 1380US6403413B2Manufacturing method of semiconductor integrated circuit device having a capacitorHITACHI LTD·Filed 2001·Granted Jun 11, 2002·26 cites·19 claims
- 1477US6632744B2Manufacturing method of semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Oct 14, 2003·17 cites·42 claims
- 1572US7001712B2Manufacturing method of semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2003·Granted Feb 21, 2006·13 cites·11 claims
- 1670US6225011B1Method for manufacturing semiconductor devices utilizing plurality of exposure systemsHITACHI LTD·Filed 1999·Granted May 1, 2001·38 cites·10 claims
- 1769US10634990B2Photomask and methods for manufacturing and correcting photomaskDAINIPPON PRINTING CO LTD·Filed 2019·Granted Apr 28, 2020·0 cites·8 claims
- 1869US7387867B2Manufacturing method of semiconductor integrated circuit deviceHITACHI LTD·Filed 2004·Granted Jun 17, 2008·12 cites·18 claims
- 1968US6706452B2Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Mar 16, 2004·9 cites·37 claims
- 2067US6824958B2Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2001·Granted Nov 30, 2004·8 cites·19 claims
- 2163US9971238B2Mask blank, phase shift mask, and production method thereofDAINIPPON PRINTING CO LTD·Filed 2015·Granted May 15, 2018·1 cites·19 claims
- 2255US5578421APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1995·Granted Nov 26, 1996·10 cites·29 claims
- 2354US6750496B2Manufacturing method of semiconductor integrated circuit device, and semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2002·Granted Jun 15, 2004·5 cites·2 claims
- 2454US2008057408A9Photomask and pattern forming method employing the sameRENESAS TECH CORP·Filed 2005·Application pending·0 cites
- 2553US2007128556A1Method of manufacturing semiconductor integrated circuit devicesHASEGAWA NORIO·Filed 2007·Application pending·0 cites
- 2651US6258513B1Photomask and pattern forming method employing the sameHITACHI LTD·Filed 2000·Granted Jul 10, 2001·1 cites·19 claims
- 2749US6841399B2Method of manufacturing mask and method of manufacturing semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2003·Granted Jan 11, 2005·3 cites·38 claims
- 2849US5656400APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1996·Granted Aug 12, 1997·7 cites·8 claims
- 2948US7172853B2Method of manufacturing semiconductor integrated circuit devicesRENESAS TECH CORP·Filed 2004·Granted Feb 6, 2007·1 cites·18 claims
- 3047US9874808B2Mask blank, mask blank with negative resist film, phase shift mask, and method for producing pattern formed body using sameDAINIPPON PRINTING CO LTD·Filed 2014·Granted Jan 23, 2018·0 cites·20 claims
- 3146US7115344B2Photomask and pattern forming method employing the sameRENESAS TECH CORP·Filed 2004·Granted Oct 3, 2006·0 cites·19 claims
- 3246US5851703APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1997·Granted Dec 22, 1998·6 cites·20 claims
- 3344US6733953B2Photomask and pattern forming method employing the sameRENESAS TECH CORP·Filed 2002·Granted May 11, 2004·0 cites·8 claims
- 3443US6383718B2Photomask and pattern forming method employing the sameHITACHI LTD·Filed 2001·Granted May 7, 2002·0 cites·19 claims
- 3541US2005277065A1Method of manufacturing a semiconductor deviceHASEGAWA NORIO·Filed 2005·Application pending·0 cites
- 3641US2005208427A1Semiconductor device manufacturing methodHAYANO KATSUYA·Filed 2005·Application pending·0 cites
- 3736US6087074APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1999·Granted Jul 11, 2000·2 cites·37 claims
- 3836US6013398APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1998·Granted Jan 11, 2000·2 cites·37 claims
- 3933US2003143472A1Manufacturing method of photomaskFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →