Inventor · disambiguated record
Kazuyoshi Inoue
Also filed as: INOUE KAZUYOSHI
81 granted patents·39 pending applications·2,570 citations·filing 1993–2025
99Inventor score
Top patents by PatentIndex Score
120 records- 0199US8981369B2Field effect transistor using oxide semiconductor and method for manufacturing the sameIDEMITSU KOSAN CO·Filed 2013·Granted Mar 17, 2015·86 cites·7 claims
- 0299US8384077B2Field effect transistor using oxide semicondutor and method for manufacturing the sameIDEMITSU KOSAN CO·Filed 2008·Granted Feb 26, 2013·247 cites·12 claims
- 0398US8791457B2Oxide semiconductor field effect transistor and method for manufacturing the sameIDEMITSU KOSAN CO·Filed 2013·Granted Jul 29, 2014·52 cites·16 claims
- 0498US8723175B2Oxide semiconductor field effect transistor and method for manufacturing the sameIDEMITSU KOSAN CO·Filed 2013·Granted May 13, 2014·60 cites·14 claims
- 0598US8461583B2Oxide semiconductor field effect transistor and method for manufacturing the sameYANO KOKI·Filed 2008·Granted Jun 11, 2013·81 cites·17 claims
- 0698US8232552B2Noncrystalline oxide semiconductor thin film, process for producing the noncrystalline oxide semiconductor thin film, process for producing thin-film transistor, field-effect-transistor, light emitting device, display device, and sputtering targetYANO KOKI·Filed 2008·Granted Jul 31, 2012·135 cites·18 claims
- 0798US8158974B2Semiconductor device, polycrystalline semiconductor thin film, process for producing polycrystalline semiconductor thin film, field effect transistor, and process for producing field effect transistorYANO KOKI·Filed 2008·Granted Apr 17, 2012·114 cites·10 claims
- 0898US8030195B2TFT substrate and method for manufacturing TFT substrateIDEMITSU KOSAN CO·Filed 2010·Granted Oct 4, 2011·69 cites·17 claims
- 0998US7998372B2Semiconductor thin film, method for manufacturing the same, thin film transistor, and active-matrix-driven display panelIDEMITSU KOSAN CO·Filed 2006·Granted Aug 16, 2011·218 cites·18 claims
- 1098US7306861B2Sputtering target, sintered compact, electrically conductive film produced by using the same, and organic EL device and substrate used for the sameIDEMITSU KOSAN CO·Filed 2006·Granted Dec 11, 2007·45 cites·7 claims
- 1197US8668849B2Sputtering target, oxide semiconductor film and semiconductor deviceINOUE KAZUYOSHI·Filed 2012·Granted Mar 11, 2014·32 cites·18 claims
- 1297US8642402B2Thin film transistor manufacturing method, thin film transistor, thin film transistor substrate and image display apparatus, image display apparatus and semiconductor deviceYANO KOKI·Filed 2008·Granted Feb 4, 2014·69 cites·32 claims
- 1397US8333913B2Sputtering target, oxide semiconductor film and semiconductor deviceINOUE KAZUYOSHI·Filed 2008·Granted Dec 18, 2012·54 cites·12 claims
- 1497US7982215B2TFT substrate and method for manufacturing TFT substrateIDEMITSU KOSAN CO·Filed 2006·Granted Jul 19, 2011·81 cites·38 claims
- 1597US7906777B2Semiconductor thin film and method for manufacturing same, and thin film transistorIDEMITSU KOSAN CO·Filed 2006·Granted Mar 15, 2011·58 cites·20 claims
- 1696US8778722B2TFT substrate and method for producing TFT substrateINOUE KAZUYOSHI·Filed 2011·Granted Jul 15, 2014·25 cites·26 claims
- 1796US8748879B2Semiconductor device, thin film transistor and a method for producing the sameYANO KOKI·Filed 2008·Granted Jun 10, 2014·74 cites·70 claims
- 1896US8455371B2Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistorYANO KOKI·Filed 2009·Granted Jun 4, 2013·33 cites·18 claims
- 1996US8153031B2In-Ga-Zn-Sn type oxide sinter and target for physical film depositionYANO KOKI·Filed 2007·Granted Apr 10, 2012·38 cites·18 claims
- 2095US9136338B2Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistorIDEMITSU KOSAN CO·Filed 2013·Granted Sep 15, 2015·15 cites·14 claims
- 2195US8038857B2Thin film transistor, thin film transistor substrate, processes for producing the same, liquid crystal display using the same, and related devices and processes; and sputtering target, transparent electroconductive film formed by use of this, transparent electrode, and related devices and processesIDEMITSU KOSAN CO·Filed 2005·Granted Oct 18, 2011·32 cites·7 claims
- 2295US6669830B1Sputtering target, transparent conductive oxide, and process for producing the sputtering targetIDEMITSU KOSAN CO·Filed 2000·Granted Dec 30, 2003·101 cites·23 claims
- 2394US8784700B2Sputtering target and oxide semiconductor filmINOUE KAZUYOSHI·Filed 2007·Granted Jul 22, 2014·22 cites·10 claims
- 2494US8530891B2Field-effect transistor, and process for producing field-effect transistorINOUE KAZUYOSHI·Filed 2008·Granted Sep 10, 2013·29 cites·39 claims
- 2594US8445903B2Thin film transistor having a crystalline semiconductor film including indium oxide which contains a hydrogen element and method for manufacturing sameINOUE KAZUYOSHI·Filed 2009·Granted May 21, 2013·30 cites·8 claims
- 2694US8263977B2TFT substrate and TFT substrate manufacturing methodINOUE KAZUYOSHI·Filed 2006·Granted Sep 11, 2012·31 cites·41 claims
- 2794US6689477B2Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass and transparent electroconductive filmIDEMITSU KOSAN CO·Filed 2002·Granted Feb 10, 2004·50 cites·23 claims
- 2893US8304359B2Sputtering target, transparent conductive film, and transparent electrode for touch panelYANO KOKI·Filed 2006·Granted Nov 6, 2012·33 cites·14 claims
- 2993US7648657B2In Sm oxide sputtering targetIDEMITSU KOSAN CO·Filed 2006·Granted Jan 19, 2010·18 cites·16 claims
- 3093US6900461B2Conductive thin film for semiconductor device, semiconductor device, and method of manufacturing the sameIDEMITSU KOSAN CO·Filed 2002·Granted May 31, 2005·75 cites·11 claims
- 3193US6534183B1Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass, and transparent electroconductive filmIDEMITSU KOSAN CO·Filed 1999·Granted Mar 18, 2003·67 cites·13 claims
- 3293US5972527ATransparent electrically conductive layer, electrically conductive transparent substrate and electrically conductive materialIDEMITSU KOSAN CO·Filed 1993·Granted Oct 26, 1999·131 cites·64 claims
- 3392US8704217B2Field effect transistor, semiconductor device and semiconductor device manufacturing methodYANO KOKI·Filed 2009·Granted Apr 22, 2014·24 cites·20 claims
- 3492US7393600B2Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use thereinIDEMITSU KOSAN CO·Filed 2003·Granted Jul 1, 2008·50 cites·16 claims
- 3590US8383019B2Sputtering target, transparent conductive film and transparent electrodeIDEMITSU KOSAN CO·Filed 2006·Granted Feb 26, 2013·8 cites·20 claims
- 3690US8038911B2Lanthanoid-containing oxide targetIDEMITSU KOSAN CO·Filed 2007·Granted Oct 18, 2011·9 cites·5 claims
- 3790US6998070B2Sputtering target and transparent conductive filmIDEMITSU KOSAN CO·Filed 2002·Granted Feb 14, 2006·41 cites·6 claims
- 3889US8623511B2Sputtering target for oxide thin film and process for producing the sputtering targetKAWASHIMA HIROKAZU·Filed 2009·Granted Jan 7, 2014·17 cites·25 claims
- 3989US6963383B2Electrode substrate and production method thereofIDEMITSU KOSAN CO·Filed 2003·Granted Nov 8, 2005·41 cites·14 claims
- 4088US8093800B2Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use thereinINOUE KAZUYOSHI·Filed 2008·Granted Jan 10, 2012·11 cites·33 claims
- 4187US9249032B2Semiconductor thin film, semiconductor thin film manufacturing method and semiconductor elementINOUE KAZUYOSHI·Filed 2008·Granted Feb 2, 2016·15 cites·6 claims
- 4286US10833201B2Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atomsIDEMITSU KOSAN CO·Filed 2016·Granted Nov 10, 2020·3 cites·5 claims
- 4386US6737589B2Flexible printed wiring boardNGK INSULATORS LTD·Filed 2002·Granted May 18, 2004·36 cites·26 claims
- 4485US11011074B2Information processing system, information processor, information processing method and programNS SOLUTIONS CORP·Filed 2017·Granted May 18, 2021·3 cites·8 claims
- 4585US7889298B2Transparent conductive film, and substrate, electronic device and liquid crystal display using the sameIDEMITSU KOSAN CO·Filed 2006·Granted Feb 15, 2011·6 cites·20 claims
- 4685US7612850B2Semi-transmissive/semi-reflective electrode substrate, method for manufacturing same, and liquid crystal display using such semi-transmissive/semi-reflective electrode substrateINOUE KAZUYOSHI·Filed 2005·Granted Nov 3, 2009·8 cites·17 claims
- 4784US11987504B2Garnet compound, sintered body and sputtering target containing sameIDEMITSU KOSAN CO·Filed 2022·Granted May 21, 2024·0 cites·10 claims
- 4884US8524123B2Sputtering target, transparent conductive film and transparent electrodeYANO KOKI·Filed 2006·Granted Sep 3, 2013·10 cites·15 claims
- 4983US11447421B2Garnet compound, oxide sintered compact, oxide semiconductor thin film, thin film transistor, electronic device and image sensorIDEMITSU KOSAN CO·Filed 2018·Granted Sep 20, 2022·1 cites·12 claims
- 5082US7897067B2Amorphous transparent conductive film, sputtering target as its raw material, amorphous transparent electrode substrate, process for producing the same and color filter for liquid crystal displayIDEMITSU KOSAN CO·Filed 2004·Granted Mar 1, 2011·21 cites·13 claims
Showing the top 50 of 120 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →