Inventor · disambiguated record
Katsunori Kawamura
Also filed as: KAWAMURA KATSUNORI
7 granted patents·1 pending application·40 citations·filing 1996–2007
80Inventor score
Files withCENTRAL GLASS CO LTD8
Top patents by PatentIndex Score
8 records- 0191US6858760B2Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning methodCENTRAL GLASS CO LTD·Filed 2004·Granted Feb 22, 2005·26 cites·15 claims
- 0268US7067691B2Process for producing α-substituted acrylic acid estersCENTRAL GLASS CO LTD·Filed 2004·Granted Jun 27, 2006·5 cites·15 claims
- 0357US7399815B2Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymersCENTRAL GLASS CO LTD·Filed 2006·Granted Jul 15, 2008·0 cites·7 claims
- 0453US7781602B2Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the sameCENTRAL GLASS CO LTD·Filed 2007·Granted Aug 24, 2010·0 cites·8 claims
- 0547US7109383B2Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymersCENTRAL GLASS CO LTD·Filed 2003·Granted Sep 19, 2006·1 cites·2 claims
- 0644US6992210B2Fluorine-containing cyclic esters, fluorine-containing cyclic alcohols, and their production processesCENTRAL GLASS CO LTD·Filed 2004·Granted Jan 31, 2006·0 cites·11 claims
- 0740US5795654AAdhesive for bonding together polyvinylidene fluoride resin and substrateCENTRAL GLASS CO LTD·Filed 1996·Granted Aug 18, 1998·8 cites·24 claims
- 0838US2006135744A1Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the sameCENTRAL GLASS CO LTD·Filed 2004·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Katsunori Kawamura files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →