Inventor · disambiguated record
Katsuyoshi Kodera
Also filed as: KODERA KATSUYOSHI
2 granted patents·14 pending applications·19 citations·filing 2009–2024
52Inventor score
Top patents by PatentIndex Score
16 records- 0183US8336006B2Mask-layout creating method, apparatus therefor, and computer program productKODERA KATSUYOSHI·Filed 2011·Granted Dec 18, 2012·19 cites·8 claims
- 0262US2024427228A1Photomask blank, photomask, and manufacturing method of photomaskKIOXIA CORP·Filed 2024·Application pending·0 cites
- 0359US2024427229A1Manufacturing method for photomask, and photomaskKIOXIA CORP·Filed 2024·Application pending·0 cites
- 0457US2024105420A1Data generation apparatus, data generation method, and computer-readable storage mediumKIOXIA CORP·Filed 2023·Application pending·0 cites
- 0550US2023092256A1Mark, template, and semicondctor device manufacturing methodKIOXIA CORP·Filed 2022·Application pending·0 cites
- 0649US2024096644A1Pattern forming method, manufacturing method of semiconductor device, and semiconductor deviceKIOXIA CORP·Filed 2023·Application pending·0 cites
- 0743US2010067777A1Evaluation pattern generating method, computer program product, and pattern verifying methodKODERA KATSUYOSHI·Filed 2009·Application pending·0 cites
- 0837US8336000B2Method for determining position of auxiliary pattern, method for manufacturing photomask, and method for manufacturing semiconductor deviceKAI YASUNOBU·Filed 2011·Granted Dec 18, 2012·0 cites·10 claims
- 0937US2015261904A1Pattern data generation method, pattern data generation device, and pattern data generation programTOSHIBA KK·Filed 2014·Application pending·0 cites
- 1032US2011065028A1Pattern generating method, manufacturing method of mask, and manufacturing method of semiconductor deviceKODERA KATSUYOSHI·Filed 2010·Application pending·0 cites
- 1132US2013017495A1Interference exposure apparatus, interference exposure method, and manufacturing method of semiconductor deviceKODERA KATSUYOSHI·Filed 2012·Application pending·0 cites
- 1232US2011029937A1Pattern evaluating method, pattern generating method, and computer program productKODERA KATSUYOSHI·Filed 2010·Application pending·0 cites
- 1331US2012244717A1Resin removal method, resin removal apparatus, and method of manufacturing semiconductor deviceZHANG YINGKANG·Filed 2011·Application pending·0 cites
- 1431US2010261121A1Pattern forming methodTAKAHASHI MASANORI·Filed 2010·Application pending·0 cites
- 1528US2010304279A1Manufacturing method of phase shift mask, creating method of mask data of phase shift mask, and manufacturing method of semiconductor deviceMIMOTOGI AKIKO·Filed 2010·Application pending·0 cites
- 1627US2016071740A1Pattern forming methodTOSHIBA KK·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →