Inventor · disambiguated record
Kazunori Kurosawa
Also filed as: KUROSAWA KAZUNORI
7 granted patents·3 pending applications·13 citations·filing 2009–2017
72Inventor score
Files withUBE INDUSTRIES2ABDALLAH DAVID1AZ ELECTRONIC MAT LUXEMBOURG SARL1AZ ELECTRONIC MATERIALS LUXEMBOURG SARL1KUROSAWA KAZUNORI1
Top patents by PatentIndex Score
10 records- 0185US8084186B2Hardmask process for forming a reverse tone image using polysilazaneABDALLAH DAVID·Filed 2009·Granted Dec 27, 2011·13 cites·15 claims
- 0242US2016122580A1Defect reduction methods and composition for via formation in directed self-assembly patterningAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2014·Application pending·0 cites
- 0341US11450805B2Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the sameMERCK PATENT GMBH·Filed 2017·Granted Sep 20, 2022·0 cites·14 claims
- 0439US9376375B2Method for producing oximeOKADA MASAHIDE·Filed 2011·Granted Jun 28, 2016·0 cites·4 claims
- 0539US8624021B2Compound and process for producing amide compound therewithSUGIMOTO TSUNEMI·Filed 2010·Granted Jan 7, 2014·0 cites·14 claims
- 0634US8796398B2Superfine pattern mask, method for production thereof, and method employing the same for forming superfine patternPADMANABAN MUNIRATHNA·Filed 2010·Granted Aug 5, 2014·0 cites·8 claims
- 0733US10392334B2Method for producing ketone and/or alcohol, and system thereofUBE INDUSTRIES·Filed 2016·Granted Aug 27, 2019·0 cites·7 claims
- 0833US10099985B2Method for producing ketone and/or alcohol, and system thereofUBE INDUSTRIES·Filed 2015·Granted Oct 16, 2018·0 cites·8 claims
- 0933US2019048129A1A polymer, composition, forming sacrificial layer and method for semiconductor device therewithAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Application pending·0 cites
- 1030US2013184494A1Oxidation Catalyst for Hydrocarbon Compound, and Method and Apparatus for Producing Oxide of Hydrocarbon Compound Using SameKUROSAWA KAZUNORI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →