Inventor · disambiguated record
Kazuhiro Marumo
Also filed as: MARUMO KAZUHIRO
6 granted patents·12 pending applications·10 citations·filing 1992–2025
70Inventor score
Top patents by PatentIndex Score
18 records- 0180US2025370343A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 0279US2025347997A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 0369US2024402601A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compoundFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0467US11029597B2Method for producing pattern laminate, method for producing reversal pattern, and pattern laminateFUJIFILM CORP·Filed 2018·Granted Jun 8, 2021·1 cites·10 claims
- 0566US2024427242A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0666US2022382153A1Positive tone resist composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 0764US2024219831A1Pattern forming method and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0859US2023067750A1Pattern formation method and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 0956US12216404B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Feb 4, 2025·0 cites·5 claims
- 1056US2022334476A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 1155US11579528B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Feb 14, 2023·0 cites·19 claims
- 1254US12235579B2Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Feb 25, 2025·0 cites·10 claims
- 1349US11584810B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resinFUJIFILM CORP·Filed 2019·Granted Feb 21, 2023·0 cites·16 claims
- 1449US2020183279A1Photosensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Application pending·0 cites
- 1546US2020183274A1Photosensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Application pending·0 cites
- 1641US5236566AVertical type stream plating apparatusNIPPON STEEL CORP·Filed 1992·Granted Aug 17, 1993·9 cites·8 claims
- 1741US2019204736A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 1836US2018037688A1Curable composition for imprints, cured product, pattern forming method, lithography method, pattern and lithography maskFUJIFILM CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →