Inventor · disambiguated record
Kazuya Masu
Also filed as: MASU KAZUYA
28 granted patents·2 pending applications·844 citations·filing 1990–2015
98Inventor score
Top patents by PatentIndex Score
30 records- 0189US5753320AProcess for forming deposited filmCANON KK·Filed 1995·Granted May 19, 1998·73 cites·12 claims
- 0289US5476547AGas feeding device for controlled vaporization of an organometallic compound used in deposition film formationCANON KK·Filed 1994·Granted Dec 19, 1995·56 cites·8 claims
- 0387US5604153AProcess for thin film formationFiled 1995·Granted Feb 18, 1997·88 cites·8 claims
- 0486US5421895AApparatus for vaporizing liquid raw material and apparatus for forming thin filmFiled 1992·Granted Jun 6, 1995·55 cites·6 claims
- 0581US5245207AIntegrated circuitMIKOSHIBA NOBUO·Filed 1990·Granted Sep 14, 1993·49 cites·31 claims
- 0679US7071806B2Variable inductor and method for adjusting inductance of sameFUJITSU LTD·Filed 2003·Granted Jul 4, 2006·21 cites·17 claims
- 0776US5755885AGas feeding device for controlled vaporization of an organometallic compound used in deposition film formationCANON KK·Filed 1995·Granted May 26, 1998·34 cites·22 claims
- 0874US5180687ADeposited film formation method utilizing selective deposition by use of alkyl aluminum hydrideCANON KK·Filed 1990·Granted Jan 19, 1993·47 cites·21 claims
- 0973US5091210APlasma CVD of aluminum filmsCANON KK·Filed 1990·Granted Feb 25, 1992·33 cites·19 claims
- 1071US7504587B2Parallel wiring and integrated circuitSEMICONDUCTOR TECH ACAD RES CT·Filed 2004·Granted Mar 17, 2009·9 cites·12 claims
- 1167US5602424ASemiconductor circuit device wiring with F.C.C. structure, plane oriention (100) and aligned with the current directionFiled 1994·Granted Feb 11, 1997·38 cites·3 claims
- 1266US5208187AMetal film forming methodTSUBOCHI KAZUO·Filed 1991·Granted May 4, 1993·40 cites·14 claims
- 1366US5179042AProcess for forming deposited film by use of alkyl aluminum hydrideCANON KK·Filed 1990·Granted Jan 12, 1993·33 cites·21 claims
- 1465US6495461B2Process for forming amorphous titanium silicon nitride on substrateCANON KK·Filed 2001·Granted Dec 17, 2002·10 cites·10 claims
- 1565US5364664AProcess for non-selectively forming deposition film on a non-electron-donative surfaceCANON KK·Filed 1992·Granted Nov 15, 1994·38 cites·23 claims
- 1663US5393699ADeposited film formation method utilizing selective deposition by use of alkyl aluminum hydrideCANON KK·Filed 1992·Granted Feb 28, 1995·29 cites·21 claims
- 1763US5328873AProcess for forming deposited film by use of alkyl aluminum hydrideCANON KUBUSHIKI KAISHA·Filed 1992·Granted Jul 12, 1994·31 cites·8 claims
- 1862US5803974AChemical vapor deposition apparatusCANON KK·Filed 1995·Granted Sep 8, 1998·21 cites·10 claims
- 1962US5779804AGas feeding device for controlled vaporization of an organanometallic compound used in deposition film formationCANON KK·Filed 1995·Granted Jul 14, 1998·18 cites·21 claims
- 2059US5316972AProcess for forming deposited film by use of alkyl aluminum hydride and process for preparing semiconductor deviceCANON KK·Filed 1992·Granted May 31, 1994·27 cites·43 claims
- 2159US5093573AReflection electron diffractometer and method for observing microscopic surface structureMIKOSHIBA NOBUO·Filed 1990·Granted Mar 3, 1992·16 cites·2 claims
- 2258US5766682AProcess for chemical vapor deposition of a liquid raw materialFiled 1995·Granted Jun 16, 1998·17 cites·14 claims
- 2355US8134419B2Digital high-frequency generator circuitNAKANO KAZUO·Filed 2010·Granted Mar 13, 2012·1 cites·13 claims
- 2454US6865174B1Code division multiple access communication systemTSUBOCHI KAZUO·Filed 1999·Granted Mar 8, 2005·21 cites·24 claims
- 2545US5196372AProcess for forming metal deposited film containing aluminum as main component by use of alkyl hydrideCANON KK·Filed 1992·Granted Mar 23, 1993·14 cites·27 claims
- 2642US6201800B1Code division multiplex communications systemCLARION CO LTD·Filed 1998·Granted Mar 13, 2001·14 cites·10 claims
- 2738US6333925B1Code division multiplex communications systemCLARION CO LTD·Filed 1998·Granted Dec 25, 2001·9 cites·8 claims
- 2832US5824150AProcess for forming deposited film by use of alkyl aluminum hydrideCANON KK·Filed 1997·Granted Oct 20, 1998·2 cites·14 claims
- 2930US2001045660A1Semiconductor device and process for forming amorphous titanium silicon nitride on substrateFiled 1998·Application pending·0 cites
- 3029US2016013763A1Amplifier circuit, cmos inverter amplifier circuit, comparator circuit, delta-sigma analog-to-digital converter, and semiconductor deviceSEMICONDUCTOR TECH ACAD RES CT·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →