Inventor · disambiguated record
Katsuhiko Murakami
Also filed as: MURAKAMI KATSUHIKO
37 granted patents·15 pending applications·1,143 citations·filing 1974–2024
98Inventor score
Top patents by PatentIndex Score
52 records- 0197US6441963B2Multi-layered mirrorNIKON CORP·Filed 2001·Granted Aug 27, 2002·181 cites·15 claims
- 0297US5581605AOptical element, production method of optical element, optical system, and optical apparatusNIKON CORP·Filed 1995·Granted Dec 3, 1996·148 cites·31 claims
- 0393US6522717B1Reflective-type soft x-ray microscopeNIKON CORP·Filed 2000·Granted Feb 18, 2003·74 cites·42 claims
- 0493US6522716B1Multilayer-film reflective mirrors, extreme UV microlithography apparatus comprising same, and microelectronic-device manufacturing methods utilizing sameNIKON CORP·Filed 2000·Granted Feb 18, 2003·49 cites·16 claims
- 0593US6333961B1Reflection masks, microlithography apparatus using same, and integrated circuit manufacturing methods employing sameNIKON CORP·Filed 2000·Granted Dec 25, 2001·52 cites·11 claims
- 0692US6507641B1X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing sameNIKON CORP·Filed 2000·Granted Jan 14, 2003·78 cites·45 claims
- 0792US3939928AWeighing method and apparatusISHIDA KOKI SEISAKUSYO KK·Filed 1974·Granted Feb 24, 1976·82 cites·1 claims
- 0888US6160867AMulti-layer X-ray-reflecting mirrors with reduced internal stressNIKON CORP·Filed 1998·Granted Dec 12, 2000·62 cites·21 claims
- 0987US4186792AApparatus for monitoring and controlling the level of the molten metal in the mold of a continuous casting machineNIPPON KOKAN KK·Filed 1977·Granted Feb 5, 1980·23 cites·1 claims
- 1086US4421185ACombinatorial weighing systemISHIDA SCALE MFG CO LTD·Filed 1981·Granted Dec 20, 1983·47 cites·7 claims
- 1184US7417708B2Extreme ultraviolet exposure apparatus and vacuum chamberNIKON CORP·Filed 2005·Granted Aug 26, 2008·7 cites·14 claims
- 1284US7382527B2EUV multilayer mirror with phase shifting layerNIKON CORP·Filed 2006·Granted Jun 3, 2008·17 cites·20 claims
- 1384US6295164B1Multi-layered mirrorNIKON CORP·Filed 1999·Granted Sep 25, 2001·49 cites·8 claims
- 1484US3974888AMethod of weighing and apparatus thereforISHIDA KOKI SEISAKUSYO KK·Filed 1974·Granted Aug 17, 1976·37 cites·6 claims
- 1581US5399448AReflection mask for X rayNIKON CORP·Filed 1992·Granted Mar 21, 1995·36 cites·20 claims
- 1680US7385212B2Collector optical system, light source unit, illumination optical apparatus, and exposure apparatusNIKON CORP·Filed 2006·Granted Jun 10, 2008·5 cites·53 claims
- 1779US6861656B2High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systemsNIKON CORP·Filed 2002·Granted Mar 1, 2005·21 cites·10 claims
- 1874US6909774B2Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systemsNIKON CORP·Filed 2002·Granted Jun 21, 2005·13 cites·5 claims
- 1974US6377655B1Reflective mirror for soft x-ray exposure apparatusNIKON CORP·Filed 1999·Granted Apr 23, 2002·42 cites·17 claims
- 2073US11746585B2Connection member for construction materials, connecting fitting therefor, connecting structure therefor, and connecting method thereforBUNKA SHUTTER·Filed 2019·Granted Sep 5, 2023·3 cites·14 claims
- 2172US7456417B2Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure deviceNIKON CORP·Filed 2006·Granted Nov 25, 2008·8 cites·39 claims
- 2270US7706058B2Multilayer mirror, method for manufacturing the same, and exposure equipmentNIKON CORP·Filed 2008·Granted Apr 27, 2010·4 cites·4 claims
- 2369US8121254B2Optical element, exposure apparatus using this, and device manufacturing methodMURAKAMI KATSUHIKO·Filed 2009·Granted Feb 21, 2012·6 cites·15 claims
- 2467US2025103960A1Computer-readable recording medium storing evaluation program, evaluation method, and evaluation apparatusFUJITSU LTD·Filed 2024·Application pending·0 cites
- 2565US2022245471A1Computer-readable recording medium storing generation program, generation method, and generation apparatusFUJITSU LTD·Filed 2021·Application pending·0 cites
- 2664US7440182B2Multilayer mirror, method for manufacturing the same, and exposure equipmentNIKON CORP·Filed 2007·Granted Oct 21, 2008·1 cites·6 claims
- 2764US4552262AArticle feeding apparatusISHIDA SCALE MFG CO LTD·Filed 1983·Granted Nov 12, 1985·19 cites·10 claims
- 2860US5239566AMulti-layered mirrorNIKON CORP·Filed 1992·Granted Aug 24, 1993·19 cites·16 claims
- 2958US12481922B2Non-transitory computer-readable storage medium for storing machine learning program, machine learning method, and machine learning apparatus of improving prediction accuracy in knowledge graph embeddingFUJITSU LTD·Filed 2022·Granted Nov 25, 2025·0 cites·8 claims
- 3058US2022414490A1Storage medium, machine learning method, and machine learning deviceFUJITSU LTD·Filed 2022·Application pending·0 cites
- 3157US2022398464A1Association rule generation program, device, and methodFUJITSU LTD·Filed 2022·Application pending·0 cites
- 3256US11450436B2Method and apparatus for machine learningFUJITSU LTD·Filed 2020·Granted Sep 20, 2022·0 cites·10 claims
- 3355US5534703AElectrophoresis analyzer with wavelength selective detectionHITACHI LTD·Filed 1994·Granted Jul 9, 1996·18 cites·20 claims
- 3454US2002049545A1Amino acid frame indication system, method for amino acid frame indication, and recording mediumHITACHI LTD AND HELIX RES INST·Filed 2001·Application pending·0 cites
- 3553US5067551AMethod for manufacturing alloy rod having giant magnetostrictionNIPPON KOKAN KK·Filed 1990·Granted Nov 26, 1991·12 cites·14 claims
- 3652US10126660B2Multilayer film reflector, method of manufacturing multilayer film reflector, projection optical system, exposure apparatus, and method of manufacturing deviceNIKON CORP·Filed 2016·Granted Nov 13, 2018·0 cites·22 claims
- 3752US5572564AReflecting photo mask for x-ray exposure and method for manufacturing the sameNIKON CORP·Filed 1995·Granted Nov 5, 1996·15 cites·15 claims
- 3851US7741616B2EUV light source, EUV exposure equipment, and semiconductor device manufacturing methodNIKON CORP·Filed 2005·Granted Jun 22, 2010·2 cites·11 claims
- 3950US8809818B2EUV light source, EUV exposure apparatus, and electronic device manufacturing methodMURAKAMI KATSUHIKO·Filed 2009·Granted Aug 19, 2014·2 cites·18 claims
- 4049US5501430AImmersion nozzle for continuous castingNIPPON KOKAN KK·Filed 1994·Granted Mar 26, 1996·6 cites·15 claims
- 4149US2008266651A1Optical apparatus, multilayer-film reflective mirror, exposure apparatus, and deviceMURAKAMI KATSUHIKO·Filed 2008·Application pending·0 cites
- 4248US12276155B2Connecting fitting construction materials and connecting method thereforBUNKA SHUTTER·Filed 2019·Granted Apr 15, 2025·0 cites·13 claims
- 4345US2008123073A1Optical element, exposure apparatus using the same, and device manufacturing methodNIKON CORP·Filed 2007·Application pending·0 cites
- 4444US2005157384A1Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising sameNIKON CORP·Filed 2004·Application pending·0 cites
- 4544US2008268380A1Optical apparatus, multilayer-film reflective mirror, exposure apparatus, and deviceMURAKAMI KATSUHIKO·Filed 2008·Application pending·0 cites
- 4641US2005147204A1Optical unit and X-ray exposure systemNIKON CORP·Filed 2004·Application pending·0 cites
- 4740US5063986AMethod for manufacturing alloy rod having giant magnetostrictionNIPPON KOKAN KK·Filed 1990·Granted Nov 12, 1991·5 cites·12 claims
- 4840US2002171922A1Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for same, and EUV optical systems comprising sameNIKON CORP·Filed 2001·Application pending·0 cites
- 4940US2003053588A1Radiation-generating devices utilizing multiple plasma-discharge sources and microlithography apparatus and methods utilizing the sameNIKON CORP·Filed 2002·Application pending·0 cites
- 5037US2017052290A1Multilayer reflective mirror, method for producing same, and exposure deviceNIKON CORP·Filed 2016·Application pending·0 cites
Showing the top 50 of 52 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →