Inventor · disambiguated record
Kazuo Nishimoto
Also filed as: NISHIMOTO KAZUO
24 granted patents·3 pending applications·773 citations·filing 1981–2009
97Inventor score
Top patents by PatentIndex Score
27 records- 0193US6720069B1Sound absorbing structureNICHIAS CORP·Filed 2000·Granted Apr 13, 2004·86 cites·35 claims
- 0293US6527818B2Aqueous dispersion for chemical mechanical polishingJSR CORP·Filed 2001·Granted Mar 4, 2003·77 cites·16 claims
- 0393US4508777ACompressed non-asbestos sheetsNICHIAS CORP·Filed 1982·Granted Apr 2, 1985·66 cites·13 claims
- 0492US6817441B2Shape memory foam member and method of producing the sameNICHIAS CORP·Filed 2001·Granted Nov 16, 2004·42 cites·14 claims
- 0592US6582761B1Method of production of composited particle, composited particle produced by this method and aqueous dispersion for chemical mechanical polishing containing this composited particle, and method of production of aqueous dispersion for chemical mechanical polishingJSR CORP·Filed 2000·Granted Jun 24, 2003·64 cites·21 claims
- 0689US6601673B2Sound absorbing structureNICHIAS CORP·Filed 2001·Granted Aug 5, 2003·43 cites·8 claims
- 0783US6924227B2Slurry for chemical mechanical polishing and method of manufacturing semiconductor deviceJSR CORP·Filed 2001·Granted Aug 2, 2005·28 cites·20 claims
- 0882US7005382B2Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishingTOSHIBA KK·Filed 2003·Granted Feb 28, 2006·30 cites·8 claims
- 0982US6500893B2Resin compositionNICHIAS CORP·Filed 2000·Granted Dec 31, 2002·25 cites·3 claims
- 1081US6383240B1Aqueous dispersion for chemical mechanical polishingJSR CORP·Filed 2000·Granted May 7, 2002·26 cites·26 claims
- 1180US7252782B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodJSR CORP·Filed 2005·Granted Aug 7, 2007·7 cites·18 claims
- 1280US6935928B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodTOSHIBA KK·Filed 2004·Granted Aug 30, 2005·24 cites·20 claims
- 1379US4477094AGasket and method for high-temperature and high pressure applicationNICHIAS CORP·Filed 1981·Granted Oct 16, 1984·43 cites·6 claims
- 1478US6786944B2Aqueous dispersion for chemical mechanical polishingJSR CORP·Filed 2003·Granted Sep 7, 2004·22 cites·20 claims
- 1578US4956226ARubber-coated gasketNICHIAS CORP·Filed 1988·Granted Sep 11, 1990·29 cites·8 claims
- 1677US5912288AVulcanized rubber compositionNICHIAS CORP·Filed 1996·Granted Jun 15, 1999·29 cites·24 claims
- 1775US4546033AGasket sheetNICHIAS CORP·Filed 1984·Granted Oct 8, 1985·32 cites·13 claims
- 1872US5300355AVibration damping materialNICHIAS CORP·Filed 1992·Granted Apr 5, 1994·45 cites·5 claims
- 1967US8652350B2Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method using the same, and method of recycling chemical mechanical polishing aqueous dispersionNISHIMOTO KAZUO·Filed 2009·Granted Feb 18, 2014·3 cites·14 claims
- 2066US5004650ARubber-coated gasket materialNICHIAS CORP·Filed 1989·Granted Apr 2, 1991·23 cites·5 claims
- 2165US6787610B2Plasma-resistant fluorine-based elastomer sealing materialNICHIAS CORP·Filed 2002·Granted Sep 7, 2004·8 cites·3 claims
- 2260US4629199AVortex gasket with composition for high-temperature and high-pressure applicationNICHIAS CORP·Filed 1984·Granted Dec 16, 1986·21 cites·3 claims
- 2349US2004164499A1Shape memory foam materialNICHIAS CORP·Filed 2004·Application pending·0 cites
- 2444US2002043736A1Shape memory foam materialFiled 2001·Application pending·0 cites
- 2542US8147977B2Thermoplastic resin composition and composite molded productNISHIMOTO KAZUO·Filed 2007·Granted Apr 3, 2012·0 cites·11 claims
- 2641US7550020B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodJSR CORP·Filed 2005·Granted Jun 23, 2009·0 cites·8 claims
- 2740US2002108807A1Soundproof cover for automobileFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →