Inventor · disambiguated record
Kazuyuki Nitta
Also filed as: NITTA KAZUYUKI
32 granted patents·10 pending applications·626 citations·filing 1996–2024
97Inventor score
Top patents by PatentIndex Score
42 records- 0195US5945517AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Aug 31, 1999·305 cites·9 claims
- 0285US5736296APositive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Apr 7, 1998·46 cites·24 claims
- 0377US6605417B2Method for decreasing surface defects of patterned resist layerTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Aug 12, 2003·14 cites·10 claims
- 0475US5908730AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jun 1, 1999·35 cites·19 claims
- 0575US5817444APositive-working photoresist composition and multilayered resist material using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Oct 6, 1998·35 cites·21 claims
- 0671US2025155806A1Resist composition, method for forming resist pattern, compound, and acid generating agentTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 0767US7232643B2Positive resist composition and compound used thereinNITTA KAZUYUKI·Filed 2005·Granted Jun 19, 2007·3 cites·12 claims
- 0863US6638684B2Photosensitive laminate, process for forming resist pattern using same and positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Oct 28, 2003·7 cites·37 claims
- 0961US5955240APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 21, 1999·23 cites·9 claims
- 1060US5948589APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 7, 1999·20 cites·8 claims
- 1159US5770343APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jun 23, 1998·15 cites·9 claims
- 1258US6818380B2Method for the preparation of a semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Nov 16, 2004·4 cites·7 claims
- 1357US7402372B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Jul 22, 2008·5 cites·12 claims
- 1457US6159652APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 12, 2000·12 cites·4 claims
- 1556US5800964APhotoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 1, 1998·20 cites·11 claims
- 1654US7358028B2Chemically amplified positive photo resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 15, 2008·10 cites·10 claims
- 1754US6777158B2Method for the preparation of a semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Aug 17, 2004·3 cites·13 claims
- 1853US5728504APositive photoresist compositions and multilayer resist materials using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Mar 17, 1998·15 cites·12 claims
- 1952US7407739B2Resist developer and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Aug 5, 2008·0 cites·9 claims
- 2051US6921621B2Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 26, 2005·9 cites·17 claims
- 2150US7150956B2Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 19, 2006·3 cites·15 claims
- 2250US2007122744A1Positive-working photoresist composition and photosensitive material using sameMAEMORI SATOSHI·Filed 2006·Application pending·0 cites
- 2348US5945248AChemical-sensitization positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Aug 31, 1999·14 cites·9 claims
- 2448US5874195APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Feb 23, 1999·9 cites·7 claims
- 2546US7094924B2Method for decreasing surface defects of patterned resist layerTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 22, 2006·1 cites·1 claims
- 2645US6444394B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 3, 2002·5 cites·4 claims
- 2744US6787290B2Positive-working photoresist composition and resist patterning method using sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 7, 2004·6 cites·8 claims
- 2842US2004072103A1Positive-working photoresist compositionFiled 2003·Application pending·0 cites
- 2941US2003203316A1Resist developer and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 3039US2002058202A1Positive-working photoresist composition and photosensitive material using sameFiled 2001·Application pending·0 cites
- 3138US7192687B2Positive resist composition and method of forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 20, 2007·0 cites·15 claims
- 3237US5854357AProcess for the production of polyhydroxstyreneTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Dec 29, 1998·3 cites·5 claims
- 3336US2005170276A1Chemical-amplification positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 3435US8399173B2Resist composition and resist pattern forming methodFUJITA SHOICHI·Filed 2006·Granted Mar 19, 2013·0 cites·4 claims
- 3535US2002106580A1Method for forming a hole-patterned photoresist layerFiled 2001·Application pending·0 cites
- 3635US2005042540A1Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 3734US6677103B2Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jan 13, 2004·1 cites·3 claims
- 3834US2007117045A1Chemical amplification type positive photoresist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 3934US2005037291A1Method for forming fine resist patternFiled 2002·Application pending·0 cites
- 4032USRE38254EPositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 16, 2003·1 cites·14 claims
- 4132US5856058AChemical-sensitization positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Jan 5, 1999·2 cites·48 claims
- 4229US7329478B2Chemical amplified positive photo resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Feb 12, 2008·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →