Inventor · disambiguated record
Kazumasa Ohashi
Also filed as: OHASHI KAZUMASA
7 granted patents·4 pending applications·17 citations·filing 1998–2018
76Inventor score
Top patents by PatentIndex Score
11 records- 0171US10006117B2Sputtering target-backing plate assembly and method for producing sameTSUKAMOTO SHIRO·Filed 2011·Granted Jun 26, 2018·2 cites·9 claims
- 0264US2018347031A1Tungsten Sintered Compact Sputtering Target and Tungsten Film Formed Using Same TargetJX NIPPON MINING & METALS CORP·Filed 2018·Application pending·0 cites
- 0363US9812301B2Tungsten sintered compact sputtering target and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2014·Granted Nov 7, 2017·1 cites·1 claims
- 0461US10047433B2Tungsten sintered compact sputtering target and tungsten film formed using same targetJX NIPPON MINING & METALS CORP·Filed 2013·Granted Aug 14, 2018·0 cites·7 claims
- 0560US2018261438A1Tungsten Sintered Compact Sputtering Target and Tungsten Film Formed Using Said TargetJX NIPPON MINING & METALS CORP·Filed 2018·Application pending·0 cites
- 0656US2015303040A1Tungsten Sintered Compact Sputtering Target and Tungsten Film Formed Using Said TargetJX NIPPON MINING & METALS CORP·Filed 2013·Application pending·0 cites
- 0754US9249497B2Ni alloy sputtering target, Ni alloy thin film and Ni silicide filmYAMAKOSHI YASUHIRO·Filed 2011·Granted Feb 2, 2016·0 cites·7 claims
- 0852US10337100B2Sputtering target comprising Ni—P alloy or Ni—Pt—P alloy and production method thereforJX NIPPON MINING & METALS CORP·Filed 2015·Granted Jul 2, 2019·0 cites·4 claims
- 0945US10176974B2Tungsten sputtering target and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2015·Granted Jan 8, 2019·0 cites·4 claims
- 1042US6226953B1Weather strip retainer with drip molding and method for producing the sameMITSUBISHI MOTORS CORP·Filed 1998·Granted May 8, 2001·14 cites·4 claims
- 1136US2016333460A1Sputtering target comprising tungsten carbide or titanium carbideJX NIPPON MINING & METALS CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →