Inventor · disambiguated record
Katsuaki Ookoshi
Also filed as: OOKOSHI KATSUAKI
12 granted patents·4 pending applications·31 citations·filing 2005–2016
87Inventor score
Files withFUJITSU SEMICONDUCTOR LTD5FUJITSU LTD3FUJITSU MICROELECTRONICS LTD3OOKOSHI KATSUAKI3FUKUDA MASAHIRO1
Top patents by PatentIndex Score
16 records- 0190US7446394B2Semiconductor device fabricated by selective epitaxial growth methodFUJITSU LTD·Filed 2007·Granted Nov 4, 2008·13 cites·8 claims
- 0277US7679147B2Semiconductor device fabricated by selective epitaxial growth methodFUJITSU MICROELECTRONICS LTD·Filed 2008·Granted Mar 16, 2010·4 cites·9 claims
- 0373US7883960B2Method of manufacturing semiconductor deviceFUJITSU SEMICONDUCTOR LTD·Filed 2009·Granted Feb 8, 2011·5 cites·7 claims
- 0470US7906798B2Semiconductor device having buffer layer between sidewall insulating film and semiconductor substrateFUJITSU SEMICONDUCTOR LTD·Filed 2007·Granted Mar 15, 2011·4 cites·16 claims
- 0565US7678711B2Semiconductor device, and method and apparatus for manufacturing the sameFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Mar 16, 2010·2 cites·6 claims
- 0661US7678641B2Semiconductor device and fabrication process thereofFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Mar 16, 2010·2 cites·11 claims
- 0760US8481383B2Method of forming semiconductor device having buffer layer between sidewall insulating film and semiconductor substrateOHTA HIROYUKI·Filed 2011·Granted Jul 9, 2013·1 cites·4 claims
- 0856US8497191B2Selective epitaxial growth method using halogen containing gate sidewall maskFUKUDA MASAHIRO·Filed 2008·Granted Jul 30, 2013·0 cites·10 claims
- 0952US9349600B2Semiconductor device manufacturing method and semiconductor deviceFUJITSU SEMICONDUCTOR LTD·Filed 2014·Granted May 24, 2016·0 cites·8 claims
- 1047US8232217B2Film deposition apparatus, method of manufacturing a semiconductor device, and method of coating the film deposition apparatusOOKOSHI KATSUAKI·Filed 2008·Granted Jul 31, 2012·0 cites·9 claims
- 1146US8980710B2Manufacturing method of semiconductor deviceFUJITSU SEMICONDUCTOR LTD·Filed 2014·Granted Mar 17, 2015·0 cites·15 claims
- 1246US2008299739A1Method of manufacturing semiconductor deviceFUJITSU LTD·Filed 2008·Application pending·0 cites
- 1344US2016240543A1Semiconductor device manufacturing method and semiconductor deviceFUJITSU SEMICONDUCTOR LTD·Filed 2016·Application pending·0 cites
- 1442US2012279451A1Film deposition apparatus, method of manufacturing a semiconductor device, and method of coating the film deposition apparatusOOKOSHI KATSUAKI·Filed 2012·Application pending·0 cites
- 1540US2006121714A1Semiconductor device and method for manufacturing the sameFUJITSU LTD·Filed 2005·Application pending·0 cites
- 1634US8409958B2Method of manufacturing semiconductor deviceOOKOSHI KATSUAKI·Filed 2011·Granted Apr 2, 2013·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →