Inventor · disambiguated record
Katsumi Oomori
Also filed as: OOMORI KATSUMI
26 granted patents·4 pending applications·315 citations·filing 1996–2004
96Inventor score
Top patents by PatentIndex Score
30 records- 0179US5939510AUndercoating composition for photolithographic resistTOKYO OHKA KOGYA CO LTD·Filed 1997·Granted Aug 17, 1999·38 cites·6 claims
- 0274US6630282B2Crosslinked positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Oct 7, 2003·14 cites·14 claims
- 0373US5756255AUndercoating composition for photolithographyTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted May 26, 1998·38 cites·8 claims
- 0472US6340553B1Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jan 22, 2002·26 cites·14 claims
- 0567US6284430B1Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 4, 2001·8 cites·5 claims
- 0666US6387587B1Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 14, 2002·22 cites·14 claims
- 0763US5700625ANegative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Dec 23, 1997·22 cites·4 claims
- 0861US6042988AChemical-amplification-type negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Mar 28, 2000·20 cites·15 claims
- 0958US6818380B2Method for the preparation of a semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Nov 16, 2004·4 cites·7 claims
- 1058US5925495APhotoresist laminate and method for patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 20, 1999·15 cites·5 claims
- 1155US6255041B1Method for formation of patterned resist layerTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 3, 2001·16 cites·10 claims
- 1255US6087068AUndercoating composition for photolithographic resistTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 11, 2000·13 cites·13 claims
- 1355US5976760AChemical-sensitization resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Nov 2, 1999·16 cites·13 claims
- 1454US6890697B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted May 10, 2005·2 cites·22 claims
- 1554US6869745B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 22, 2005·2 cites·11 claims
- 1654US6777158B2Method for the preparation of a semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Aug 17, 2004·3 cites·13 claims
- 1753US5908738AUndercoating composition for photolithographyTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jun 1, 1999·15 cites·9 claims
- 1852US6083665APhotoresist laminate and method for patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 4, 2000·11 cites·1 claims
- 1950US6815144B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 9, 2004·2 cites·11 claims
- 2046US6245930B1Chemical-sensitization resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jun 12, 2001·9 cites·7 claims
- 2143US2005042544A1Positive-working chemical-amplification photoresist compositionFiled 2004·Application pending·0 cites
- 2242US6773863B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 10, 2004·0 cites·3 claims
- 2342US6485887B2Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Nov 26, 2002·4 cites·4 claims
- 2442US5789136ANegative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 4, 1998·9 cites·9 claims
- 2539US6548229B2Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Apr 15, 2003·0 cites·4 claims
- 2634US7147984B2Positive-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Dec 12, 2006·2 cites·5 claims
- 2734US6153354AElectron beam negative working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Nov 28, 2000·4 cites·6 claims
- 2832US2002028407A1Positive-working chemical-amplification photoresist compositionFiled 2001·Application pending·0 cites
- 2926US2004023163A1Positive-working chemical-amplification photoresist compositionFiled 2003·Application pending·0 cites
- 3025US2002119393A1Positive-working chemical-amplification photoresist compositionFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →