Inventor · disambiguated record
Kazuhiro Tomioka
Also filed as: TOMIOKA KAZUHIRO
37 granted patents·18 pending applications·776 citations·filing 1993–2023
97Inventor score
Top patents by PatentIndex Score
55 records- 0197US5810963APlasma processing apparatus and methodTOSHIBA KK·Filed 1996·Granted Sep 22, 1998·157 cites·25 claims
- 0295US5897713APlasma generating apparatusTOSHIBA KK·Filed 1996·Granted Apr 27, 1999·161 cites·5 claims
- 0395US5302240AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1993·Granted Apr 12, 1994·200 cites·22 claims
- 0494US9093632B2Nonvolatile semiconductor memory device and method of manufacturing the sameTSUBATA SHUICHI·Filed 2014·Granted Jul 28, 2015·21 cites·9 claims
- 0592US9508922B2Magnetic memory device and method of manufacturing the sameYOSHIKAWA MASATOSHI·Filed 2015·Granted Nov 29, 2016·9 cites·25 claims
- 0691US10847576B2Magnetic memory device and manufacturing method thereofTOSHIBA MEMORY CORP·Filed 2019·Granted Nov 24, 2020·4 cites·14 claims
- 0791US10461245B2Magnetic memory device and method of manufacturing the sameTOSHIBA MEMORY CORP·Filed 2015·Granted Oct 29, 2019·8 cites·12 claims
- 0891US8586390B2Method for manufacturing semiconductor deviceTOMIOKA KAZUHIRO·Filed 2011·Granted Nov 19, 2013·14 cites·17 claims
- 0989US9570671B2Magnetic memory deviceYOSHIKAWA MASATOSHI·Filed 2014·Granted Feb 14, 2017·5 cites·10 claims
- 1088US8956882B1Method of manufacturing magnetoresistive elementTOMIOKA KAZUHIRO·Filed 2014·Granted Feb 17, 2015·7 cites·20 claims
- 1187US5445710AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1994·Granted Aug 29, 1995·86 cites·18 claims
- 1286US9698338B2Magnetic memory device and method of manufacturing magnetic memory deviceYOSHIKAWA MASATOSHI·Filed 2015·Granted Jul 4, 2017·5 cites·12 claims
- 1383US10490732B2Magnetic memory device with sidewall layer containing boron and manufacturing method thereofTOSHIBA MEMORY CORP·Filed 2016·Granted Nov 26, 2019·6 cites·5 claims
- 1483US8987007B2Method of manufacturing a semiconductor device having a magnetic film using plasma etchingTOSHIBA KK·Filed 2013·Granted Mar 24, 2015·4 cites·19 claims
- 1583US6780278B2Plasma processing apparatus with reduced parasitic capacity and loss in RF powerTOSHIBA KK·Filed 2001·Granted Aug 24, 2004·16 cites·16 claims
- 1682US9425388B2Magnetic element and method of manufacturing the sameTOMIOKA KAZUHIRO·Filed 2014·Granted Aug 23, 2016·4 cites·9 claims
- 1781US10193057B2Magnetic memory deviceTOSHIBA MEMORY CORP·Filed 2017·Granted Jan 29, 2019·2 cites·4 claims
- 1880US7115522B2Method for manufacturing semiconductor deviceINFINEON TECHNOLOGIES AG·Filed 2004·Granted Oct 3, 2006·23 cites·18 claims
- 1978US9595663B2Magnetic memory having magnetoresistive element and method of manufacturing magnetoresistive elementYOSHIKAWA MASATOSHI·Filed 2014·Granted Mar 14, 2017·3 cites·5 claims
- 2074US12484455B2Magnetic memory device and manufacturing method of magnetic memory deviceKIOXIA CORP·Filed 2023·Granted Nov 25, 2025·0 cites·6 claims
- 2174US10230042B2Magnetoresistive element and method of manufacturing the sameTOSHIBA MEMORY CORP·Filed 2016·Granted Mar 12, 2019·2 cites·6 claims
- 2273US7400005B2Semiconductor memory device having ferroelectric capacitors with hydrogen barriersTOSHIBA KK·Filed 2005·Granted Jul 15, 2008·5 cites·12 claims
- 2367US7015049B2Fence-free etching of iridium barrier having a steep taper angleTOSHIBA KK·Filed 2003·Granted Mar 21, 2006·11 cites·9 claims
- 2466US11659773B2Magnetic memory device and manufacturing method of magnetic memory deviceKIOXIA CORP·Filed 2021·Granted May 23, 2023·0 cites·13 claims
- 2565US10381198B2Plasma processing apparatus and plasma processing methodTOSHIBA MEMORY CORP·Filed 2013·Granted Aug 13, 2019·1 cites·13 claims
- 2665US9287495B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2013·Granted Mar 15, 2016·1 cites·19 claims
- 2762US7767582B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Granted Aug 3, 2010·1 cites·19 claims
- 2862US7589014B2Semiconductor device having multiple wiring layers and method of producing the sameTOSHIBA KK·Filed 2006·Granted Sep 15, 2009·1 cites·6 claims
- 2962US6762064B1Process for fabrication of a ferrocapacitorINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jul 13, 2004·8 cites·10 claims
- 3060US8187981B2Substrate processing method, substrate processing system, and computer-readable storage mediumTOMIOKA KAZUHIRO·Filed 2007·Granted May 29, 2012·1 cites·8 claims
- 3158US7504680B2Semiconductor device and mask patternTOSHIBA KK·Filed 2005·Granted Mar 17, 2009·2 cites·2 claims
- 3257US2019006580A1Magnetic memory deviceTOSHIBA MEMORY CORP·Filed 2018·Application pending·0 cites
- 3356US7855141B2Semiconductor device having multiple wiring layers and method of producing the sameTOSHIBA KK·Filed 2009·Granted Dec 21, 2010·0 cites·6 claims
- 3456US7745326B2Semiconductor device having multiple wiring layers and method of producing the sameTOSHIBA KK·Filed 2009·Granted Jun 29, 2010·0 cites·8 claims
- 3553US7045837B2Hardmask with high selectivity for Ir barriers for ferroelectric capacitor manufacturingTOSHIBA KK·Filed 2003·Granted May 16, 2006·5 cites·19 claims
- 3652US7042705B2Sidewall structure and method of fabrication for reducing oxygen diffusion to contact plugs during CW hole reactive ion etch processingTOSHIBA KK·Filed 2003·Granted May 9, 2006·3 cites·12 claims
- 3751US12432930B2Magnetic memory deviceKIOXIA CORP·Filed 2021·Granted Sep 30, 2025·0 cites·18 claims
- 3851US2015263272A1Manufacturing method of magnetic memory device and manufacturing apparatus of magnetic memory deviceTOMIOKA KAZUHIRO·Filed 2014·Application pending·0 cites
- 3950US2017169996A1Plasma processing apparatus and plasma processing methdoTOSHIBA KK·Filed 2017·Application pending·0 cites
- 4045US12213386B2Magnetoresistance memory device and manufacturing method of magnetoresistance memory deviceKIOXIA CORP·Filed 2022·Granted Jan 28, 2025·0 cites·16 claims
- 4145US2015295170A1Nonvolatile semiconductor memory device and method of manufacturing the sameTSUBATA SHUICHI·Filed 2015·Application pending·0 cites
- 4245US2004238126A1Plasma processing apparatus with reduced parasitic capacity and loss in RF powerTOSHIBA KK·Filed 2004·Application pending·0 cites
- 4341US2013149795A1Etching method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2012·Application pending·0 cites
- 4440US2002187625A1Semiconductor device have multiple wiring layers and method of producing the sameTOSHIBA KK·Filed 2002·Application pending·0 cites
- 4539US2013017626A1Etching apparatus and method of manufacturing semiconductor deviceTOMIOKA KAZUHIRO·Filed 2012·Application pending·0 cites
- 4639US2015263275A1Manufacturing method of magnetic memory device and manufacturing apparatus of magnetic memory deviceTOMIOKA KAZUHIRO·Filed 2014·Application pending·0 cites
- 4738US2005070043A1Semiconductor device and method for manufacturing the sameFiled 2003·Application pending·0 cites
- 4838US2006071258A1Semiconductor deviceTOMIOKA KAZUHIRO·Filed 2004·Application pending·0 cites
- 4937US2004171274A1Method for formation of hardmask elements during a semiconductor device fabrication processFiled 2003·Application pending·0 cites
- 5036US2005128663A1Semiconductor device and method of manufacturing the sameFiled 2004·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →