Inventor · disambiguated record
Kenta Ishiwata
Also filed as: ISHIWATA KENTA
3 granted patents·31 pending applications·0 citations·filing 2020–2025
40Inventor score
Top patents by PatentIndex Score
34 records- 0166US2025076756A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0266US2024427247A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Method For Manufacturing Compound For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0365US2025115736A1Composition For Forming Metal-Containing Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0465US2025060670A1Method For Forming Resist Underlayer Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0564US2025036024A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Method For Manufacturing Compound For Forming Metal-Containing FilmSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0664US2025208510A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0763US11680133B2Material for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jun 20, 2023·0 cites·20 claims
- 0863US2024345483A1Method For Forming Resist Underlayer Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0959US2025036029A1Method For Forming Resist Underlayer Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1059US2025028246A1Composition For Forming Resist Underlayer Film, Patterning Process, And Method For Forming Resist Underlayer FilmSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1157US2025208506A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1257US2025208511A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1357US2024310732A1Method For Forming Resist Underlayer Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1457US2025372377A1Metal-containing film patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1557US2025231485A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1657US2025208512A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1757US2025208509A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1857US2025372378A1Patterning ProcessSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1956US2024321585A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2056US2025362595A1Compound for forming metal-containing film, composition for forming metal-containing film, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 2155US2025347989A1Compound for forming metal-containing film, composition for forming metal-containing film, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 2255US2025087495A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2355US2024255851A1Composition For Forming Resist Underlayer Film, Patterning Process, And Method For Forming Resist Underlayer FilmSHINE ETSU CHEMICAL CO LTD·Filed 2024·Application pending·0 cites
- 2455US2025085636A1Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2554US2025368837A1Composition For Forming Metal-Containing Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2654US2023274936A1Planarizing agent for forming organic film, composition for forming organic film, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 2753US2024297041A1Patterning ProcessSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 2851US11782347B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Oct 10, 2023·0 cites·20 claims
- 2948US2025263639A1Cleaning Solution, Method For Cleaning Substrate, And Method For Forming Metal Containing FilmSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3047US2025237955A1Composition For Forming Adhesive Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3147US2025246429A1Pattern Forming Method And LaminateSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3246US2025239458A1Composition For Forming Metal-Containing Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3346US2025237954A1Composition For Forming Metal-Containing Film And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3445US11709429B2Composition for forming organic film, patterning process, and polymerSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 25, 2023·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →