Inventor · disambiguated record
Kesahiro Koike
Also filed as: KOIKE KESAHIRO
7 granted patents·2 pending applications·108 citations·filing 1998–2009
86Inventor score
Files withHOYA CORP9
Top patents by PatentIndex Score
9 records- 0191US7455785B2Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatusHOYA CORP·Filed 2005·Granted Nov 25, 2008·24 cites·6 claims
- 0285US6951502B2Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatusHOYA CORP·Filed 2003·Granted Oct 4, 2005·30 cites·54 claims
- 0380US7691279B2Method of producing a glass substrate for a mask blank and method of producing a mask blankHOYA CORP·Filed 2004·Granted Apr 6, 2010·12 cites·19 claims
- 0478US7732101B2Method of producing a glass substrate for a mask blank by polishing with an alkaline polishing liquid that contains colloidal silica abrasive grainsHOYA CORP·Filed 2008·Granted Jun 8, 2010·7 cites·10 claims
- 0572US7413832B2Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer maskHOYA CORP·Filed 2003·Granted Aug 19, 2008·17 cites·13 claims
- 0660US6127068AX-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, manufacturing method thereof and method of polishing silicon carbide filmHOYA CORP·Filed 1998·Granted Oct 3, 2000·18 cites·9 claims
- 0755US2009280415A1Transparent substrate for mask blank and mask blankHOYA CORP·Filed 2009·Application pending·0 cites
- 0850US7635544B2Transparent substrate for mask blank and mask blankHOYA CORP·Filed 2005·Granted Dec 22, 2009·0 cites·13 claims
- 0942US2004192171A1Method of producing a glass substrate for a mask blank and method of producing a mask blankHOYA CORP·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →