Inventor · disambiguated record
Keun Kyu Kong
Also filed as: KONG KEUN K · KONG KEUN KYU
30 granted patents·5 pending applications·1,215 citations·filing 1998–2017
97Inventor score
Files withHYNIX SEMICONDUCTOR INC18HYUNDAI ELECTRONICS IND12SK HYNIX INC4HYUNDAI ELECTRONICS CO LTD1
Top patents by PatentIndex Score
35 records- 0199US6455225B1Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Sep 24, 2002·465 cites·22 claims
- 0298US6368773B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Apr 9, 2002·473 cites·10 claims
- 0390US6703323B2Method of inhibiting pattern collapse using a relacs materialHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Mar 9, 2004·49 cites·7 claims
- 0490US6395451B1Photoresist composition containing photo base generator with photo acid generatorHYUNDAI ELECTRONICS IND·Filed 2000·Granted May 28, 2002·48 cites·17 claims
- 0589US7033729B2Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Apr 25, 2006·32 cites·14 claims
- 0679US7510973B2Method for forming fine pattern in semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Mar 31, 2009·6 cites·12 claims
- 0777US6322948B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 27, 2001·15 cites·10 claims
- 0877US6312868B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Nov 6, 2001·14 cites·19 claims
- 0976US6764806B2Over-coating composition for photoresist, and processes for forming photoresist patterns using the sameHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 20, 2004·17 cites·20 claims
- 1075US6291131B1Monomers for photoresist, polymers thereof, and photoresist compositions using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Sep 18, 2001·18 cites·32 claims
- 1170US7582525B2Method for fabricating capacitor of semiconductor memory device using amorphous carbonHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Sep 1, 2009·4 cites·17 claims
- 1267US7749895B2Capacitor of semiconductor device and method for fabricating the sameHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Jul 6, 2010·3 cites·12 claims
- 1366US6984482B2Top-coating composition for photoresist and process for forming fine pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jan 10, 2006·6 cites·8 claims
- 1466US6482565B1Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 19, 2002·11 cites·16 claims
- 1562US6664031B2Process for forming photoresist pattern by using gas phase amine treatmentHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Dec 16, 2003·7 cites·12 claims
- 1661US6593446B1Organic polymer for organic anti-reflective coating layer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2000·Granted Jul 15, 2003·4 cites·18 claims
- 1760US6165672AMaleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resinHYUNDAI ELECTRONICS IND·Filed 1998·Granted Dec 26, 2000·24 cites·31 claims
- 1858US7563753B2Cleaning solution for removing photoresistHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jul 21, 2009·2 cites·15 claims
- 1957US6770720B2Organic polymer for organic anti-reflective coating layer and preparation thereofHYUNDAI ELECTRONICS IND·Filed 2002·Granted Aug 3, 2004·3 cites·21 claims
- 2053US6514665B1Additives for improving post exposure delay stability of photoresistHYUNDAI ELECTRONICS CO LTD·Filed 2000·Granted Feb 4, 2003·3 cites·18 claims
- 2151US6787285B2Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generatorHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Sep 7, 2004·4 cites·17 claims
- 2249US7510979B2Method for forming a pattern on a semiconductor device and semiconductor device resulting from the sameHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Mar 31, 2009·0 cites·5 claims
- 2348US7329477B2Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Feb 12, 2008·1 cites·7 claims
- 2447US2018120707A1Composition for coating photoresist pattern and method for forming fine pattern using the sameSK HYNIX INC·Filed 2017·Application pending·0 cites
- 2546US7674708B2Method for forming fine patterns of a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Mar 9, 2010·0 cites·15 claims
- 2645US7285370B2Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Oct 23, 2007·0 cites·6 claims
- 2745US7160668B2Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Jan 9, 2007·5 cites·14 claims
- 2844US2017102619A1Composition for coating photoresist pattern and method for forming fine pattern using the sameSK HYNIX INC·Filed 2016·Application pending·0 cites
- 2941US7186496B2Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Mar 6, 2007·0 cites·14 claims
- 3041US2008176047A1Liquid Composition for Immersion Lithography and Lithography Method Using the SameHYNIX SEMICONDUCTOR INC·Filed 2007·Application pending·0 cites
- 3140US9947546B2Semiconductor integrated circuit device with a surface and method of manufacturing the sameSK HYNIX INC·Filed 2016·Granted Apr 17, 2018·0 cites·17 claims
- 3240US6399792B2Photoresist cross-linker and photoresist composition comprising the sameHYUNDAI ELECTRONICS IND·Filed 2001·Granted Jun 4, 2002·0 cites·2 claims
- 3336US2005260528A1Liquid composition for immersion lithography and lithography method using the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Application pending·0 cites
- 3435US7208260B2Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Apr 24, 2007·1 cites·21 claims
- 3530US2017032960A1Composition for coating photoresist pattern and method for forming fine pattern using the sameSK HYNIX INC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →