Inventor · disambiguated record
Kenji Konomi
Also filed as: KONOMI KENJI
12 granted patents·4 pending applications·102 citations·filing 2001–2021
88Inventor score
Top patents by PatentIndex Score
16 records- 0194US6674511B2Evaluation mask, focus measuring method and aberration measuring methodTOSHIBA KK·Filed 2001·Granted Jan 6, 2004·58 cites·23 claims
- 0279US6741327B2Method of correcting projection optical system and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2001·Granted May 25, 2004·17 cites·5 claims
- 0378US6940585B2Evaluation mask, focus measuring method and aberration measuring methodTOSHIBA KK·Filed 2003·Granted Sep 6, 2005·14 cites·21 claims
- 0472US10040219B2Mold and mold manufacturing methodTOSHIBA MEMORY CORP·Filed 2013·Granted Aug 7, 2018·2 cites·16 claims
- 0571US10026698B2Reducing wafer warpage during wafer processingTOSHIBA MEMORY CORP·Filed 2017·Granted Jul 17, 2018·1 cites·7 claims
- 0669US9881121B2Verification method of mask pattern, manufacturing method of a semiconductor device and nontransitory computer readable medium storing a mask pattern verification programTOSHIBA MEMORY CORP·Filed 2015·Granted Jan 30, 2018·1 cites·20 claims
- 0765US9079602B2Steering system and steering control apparatusKONOMI KENJI·Filed 2011·Granted Jul 14, 2015·6 cites·12 claims
- 0861US8785329B2Method for forming pattern and method for manufacturing semiconductor deviceMAEDA SHIMON·Filed 2012·Granted Jul 22, 2014·1 cites·20 claims
- 0959US8127256B2Pattern data generation method, design layout generating method, and pattern data verifying programKONOMI KENJI·Filed 2008·Granted Feb 28, 2012·2 cites·20 claims
- 1050US9812403B2Reducing wafer warpage during wafer processingTOSHIBA MEMORY CORP·Filed 2015·Granted Nov 7, 2017·0 cites·6 claims
- 1148US11824011B2Memory device and method of manufacturing memory deviceKIOXIA CORP·Filed 2021·Granted Nov 21, 2023·0 cites·6 claims
- 1247US2009190108A1Method and system for leveling topography of semiconductor chip surfaceTOSHIBA AMERICA ELECTRONIC·Filed 2008·Application pending·0 cites
- 1345US10276459B2Measurement method, measurement program, and measurement systemTOSHIBA MEMORY CORP·Filed 2017·Granted Apr 30, 2019·0 cites·17 claims
- 1442US2008044739A1Correction Of Resist Critical Dimension Variations In Lithography ProcessesTOSHIBA AMERICA ELECTRONIC·Filed 2006·Application pending·0 cites
- 1538US2013328155A1Generation of additional shapes on a photomask for a multiple exposure processKONOMI KENJI·Filed 2012·Application pending·0 cites
- 1633US2010234973A1Pattern verifying method, method of manufacturing a semiconductor device and pattern verifying programKONOMI KENJI·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →