Inventor · disambiguated record
Keiichi Masunaga
Also filed as: MASUNAGA KEIICHI
62 granted patents·35 pending applications·262 citations·filing 2007–2025
98Inventor score
Top patents by PatentIndex Score
97 records- 0197US9645493B2Negative resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Granted May 9, 2017·11 cites·11 claims
- 0296US10120279B2Negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 6, 2018·8 cites·13 claims
- 0396US9075306B2Chemically amplified negative resist composition and patterning processTAKEDA TAKANOBU·Filed 2011·Granted Jul 7, 2015·22 cites·8 claims
- 0496US8470511B2Chemically amplified negative resist composition for EB or EUV lithography and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Jun 25, 2013·16 cites·17 claims
- 0596US8361693B2Chemically amplified positive photoresist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·32 cites·10 claims
- 0695US8426108B2Chemically amplified positive resist composition for EB or EUV lithography and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Apr 23, 2013·13 cites·5 claims
- 0795US8343694B2Photomask blank, resist pattern forming process, and photomask preparation processSHINETSU CHEMICAL CO·Filed 2011·Granted Jan 1, 2013·11 cites·6 claims
- 0894US9720323B2Chemically amplified positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 1, 2017·11 cites·12 claims
- 0994US8288076B2Chemically amplified resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2010·Granted Oct 16, 2012·12 cites·15 claims
- 1092US9969829B2Polymer compound, negative resist composition, laminate, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2017·Granted May 15, 2018·3 cites·20 claims
- 1192US9904169B2Photomask blank, resist pattern forming process, and method for making photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Feb 27, 2018·5 cites·13 claims
- 1292US9740098B2Chemically amplified negative resist composition using novel onium salt and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 22, 2017·5 cites·13 claims
- 1392US9244348B2Chemically amplified negative resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2012·Granted Jan 26, 2016·8 cites·5 claims
- 1492US8470512B2Polymer, chemically amplified negative resist composition, and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Jun 25, 2013·10 cites·10 claims
- 1591US8632939B2Polymer, chemically amplified positive resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2011·Granted Jan 21, 2014·8 cites·12 claims
- 1689US9604921B2Sulfonium salt, resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2015·Granted Mar 28, 2017·5 cites·14 claims
- 1789US8835097B2Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning processDOMON DAISUKE·Filed 2012·Granted Sep 16, 2014·9 cites·28 claims
- 1888US9558862B2Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the compositionSHINETSU POLYMER CO·Filed 2013·Granted Jan 31, 2017·4 cites·16 claims
- 1987US11231650B2Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Jan 25, 2022·3 cites·17 claims
- 2087US8815491B2Chemically amplified negative resist composition and patterning processMASUNAGA KEIICHI·Filed 2012·Granted Aug 26, 2014·5 cites·4 claims
- 2187US8691490B2Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning processOHASHI MASAKI·Filed 2011·Granted Apr 8, 2014·4 cites·2 claims
- 2285US9436083B2Chemically-amplified negative resist composition and resist patterning process using the sameSHINETSU CHEMICAL CO·Filed 2015·Granted Sep 6, 2016·3 cites·20 claims
- 2384US9500949B2Chemically-amplified positive resist composition and resist patterning process using the sameSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 22, 2016·3 cites·20 claims
- 2484US9182670B2Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Nov 10, 2015·3 cites·9 claims
- 2583US8361692B2Negative resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·4 cites·18 claims
- 2682US10725377B2Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 28, 2020·2 cites·17 claims
- 2782US7501223B2Polymer, resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 10, 2009·20 cites·23 claims
- 2880US11548844B2Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Jan 10, 2023·1 cites·10 claims
- 2978US8110335B2Resist patterning process and manufacturing photo maskTAKEDA TAKANOBU·Filed 2009·Granted Feb 7, 2012·6 cites·9 claims
- 3077US11429023B2Onium salt, negative resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Aug 30, 2022·1 cites·18 claims
- 3175US2025355356A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3274US8273830B2Deprotection method of protected polymerMASUNAGA KEIICHI·Filed 2010·Granted Sep 25, 2012·2 cites·7 claims
- 3373US10416558B2Positive resist composition, resist pattern forming process, and photomask blankSHINETSU CHEMICAL CO·Filed 2017·Granted Sep 17, 2019·1 cites·12 claims
- 3473US10345700B2Negative-tone resist compositions and multifunctional polymers thereinIBM·Filed 2014·Granted Jul 9, 2019·1 cites·20 claims
- 3573US2025053089A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 3672US2024219836A1Conductive Polymer Composition, Coated Product, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 3771US8389201B2Positive resist composition and pattern forming processTANAKA AKINOBU·Filed 2010·Granted Mar 5, 2013·2 cites·10 claims
- 3870US8603724B2Negative resist composition and patterning processTANAKA AKINOBU·Filed 2010·Granted Dec 10, 2013·2 cites·18 claims
- 3970US2025278023A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 4070US2025110400A1Onium salt, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 4170US2025270357A1Polymer, chemically amplified negative resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 4269US8951710B2Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Feb 10, 2015·1 cites·4 claims
- 4369US2025264802A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 4469US2024427241A1Monomer, polymer, chemically amplified negative resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 4569US2025068067A1Onium salt, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 4668US8968979B2Positive resist composition and patterning processTAKEMURA KATSUYA·Filed 2009·Granted Mar 3, 2015·2 cites·16 claims
- 4768US2024280900A1Onium salt, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 4868US2024329532A1Acetal modifier, polymer, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 4967US11500285B2Multifunctional polymersIBM·Filed 2018·Granted Nov 15, 2022·0 cites·9 claims
- 5067US8835096B2Chemically amplified negative resist composition and patterning processMASUNAGA KEIICHI·Filed 2012·Granted Sep 16, 2014·1 cites·4 claims
Showing the top 50 of 97 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →