Inventor · disambiguated record
Kenneth Mccullough
Also filed as: MCCULLOUGH KENNETH J · MCCULLOUGH KENNETH JOHN
44 granted patents·5 pending applications·1,357 citations·filing 1996–2007
98Inventor score
Top patents by PatentIndex Score
49 records- 0198US6558475B1Process for cleaning a workpiece using supercritical carbon dioxideIBM·Filed 2000·Granted May 6, 2003·126 cites·25 claims
- 0296US5908510AResidue removal by supercritical fluidsIBM·Filed 1996·Granted Jun 1, 1999·206 cites·23 claims
- 0394US6346484B1Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structuresIBM·Filed 2000·Granted Feb 12, 2002·80 cites·12 claims
- 0494US5976264ARemoval of fluorine or chlorine residue by liquid CO2IBM·Filed 1998·Granted Nov 2, 1999·142 cites·19 claims
- 0593US6561220B2Apparatus and method for increasing throughput in fluid processingIBM·Filed 2001·Granted May 13, 2003·71 cites·9 claims
- 0691US6451375B1Process for depositing a film on a nanometer structureIBM·Filed 2001·Granted Sep 17, 2002·33 cites·11 claims
- 0790US6398875B1Process of drying semiconductor wafers using liquid or supercritical carbon dioxideIBM·Filed 2001·Granted Jun 4, 2002·53 cites·10 claims
- 0889US6425956B1Process for removing chemical mechanical polishing residual slurryIBM·Filed 2001·Granted Jul 30, 2002·44 cites·8 claims
- 0988US6584989B2Apparatus and method for wet cleaningIBM·Filed 2001·Granted Jul 1, 2003·50 cites·16 claims
- 1086US6673521B2Supercritical fluid(SCF) silylation processLNTERNAT BUSINESS MACHINES COR·Filed 2000·Granted Jan 6, 2004·27 cites·19 claims
- 1184US6656666B2Topcoat process to prevent image collapseIBM·Filed 2000·Granted Dec 2, 2003·27 cites·16 claims
- 1283US6622507B2Electromechanical device and a process of preparing sameIBM·Filed 2001·Granted Sep 23, 2003·27 cites·16 claims
- 1383US6509136B1Process of drying a cast polymeric film disposed on a workpieceIBM·Filed 2001·Granted Jan 21, 2003·21 cites·11 claims
- 1480US6838015B2Liquid or supercritical carbon dioxide compositionIBM·Filed 2001·Granted Jan 4, 2005·20 cites·8 claims
- 1580US6834671B2Check valve for micro electro mechanical structure devicesIBM·Filed 2003·Granted Dec 28, 2004·19 cites·6 claims
- 1680US6736906B2Turbine part mount for supercritical fluid processorIBM·Filed 2002·Granted May 18, 2004·16 cites·28 claims
- 1780US6454869B1Process of cleaning semiconductor processing, handling and manufacturing equipmentIBM·Filed 2001·Granted Sep 24, 2002·24 cites·9 claims
- 1878US6200891B1Removal of dielectric oxidesIBM·Filed 1998·Granted Mar 13, 2001·54 cites·29 claims
- 1977US6683008B1Process of removing ion-implanted photoresist from a workpieceIBM·Filed 2002·Granted Jan 27, 2004·19 cites·14 claims
- 2076US6033996AProcess for removing etching residues, etching mask and silicon nitride and/or silicon dioxideIBM·Filed 1997·Granted Mar 7, 2000·48 cites·23 claims
- 2175US7288155B2Method for the rapid thermal control of a work piece in liquid or supercritical fluidIBM·Filed 2005·Granted Oct 30, 2007·3 cites·7 claims
- 2274US8828143B2Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluidSIMONS JOHN P·Filed 2007·Granted Sep 9, 2014·3 cites·12 claims
- 2374US6457480B1Process and apparatus for cleaning filtersIBM·Filed 2001·Granted Oct 1, 2002·9 cites·10 claims
- 2471US6875286B2Solid CO2 cleaningIBM·Filed 2002·Granted Apr 5, 2005·15 cites·10 claims
- 2571US5780363AEtching composition and use thereofIBM·Filed 1997·Granted Jul 14, 1998·43 cites·19 claims
- 2670US6927393B2Method of in situ monitoring of supercritical fluid process conditionsIBM·Filed 2002·Granted Aug 9, 2005·8 cites·12 claims
- 2767US5965465AEtching of silicon nitrideIBM·Filed 1997·Granted Oct 12, 1999·28 cites·17 claims
- 2866US6892741B2Apparatus and process for supercritical carbon dioxide phase processingIBM·Filed 2004·Granted May 17, 2005·5 cites·4 claims
- 2965US6890855B2Process of removing residue material from a precision surfaceIBM·Filed 2001·Granted May 10, 2005·9 cites·20 claims
- 3064US8388758B2Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluidSIMONS JOHN P·Filed 2007·Granted Mar 5, 2013·1 cites·4 claims
- 3164US6066267AEtching of silicon nitrideIBM·Filed 1999·Granted May 23, 2000·24 cites·10 claims
- 3263US7081208B2Method to build a microfilterIBM·Filed 2002·Granted Jul 25, 2006·9 cites·3 claims
- 3363US6739346B2Apparatus for cleaning filtersIBM·Filed 2002·Granted May 25, 2004·4 cites·4 claims
- 3461US6579464B2Fixtures for processing a workpiece in a supercritical fluidIBM·Filed 2001·Granted Jun 17, 2003·4 cites·22 claims
- 3561US6254796B1Selective etching of silicateIBM·Filed 1998·Granted Jul 3, 2001·24 cites·20 claims
- 3661US6150282ASelective removal of etching residuesIBM·Filed 1997·Granted Nov 21, 2000·25 cites·40 claims
- 3759US6653233B2Process of providing a semiconductor device with electrical interconnection capabilityIBM·Filed 2001·Granted Nov 25, 2003·6 cites·8 claims
- 3859US6117796ARemoval of silicon oxideIBM·Filed 1998·Granted Sep 12, 2000·23 cites·17 claims
- 3958US6953042B2Apparatus and process for supercritical carbon dioxide phase processingIBM·Filed 2002·Granted Oct 11, 2005·2 cites·4 claims
- 4055US6821488B1Sample holding chuck for use in reactor and reactor using sameIBM·Filed 2000·Granted Nov 23, 2004·4 cites·25 claims
- 4154US7485964B2Dielectric materialIBM·Filed 2006·Granted Feb 3, 2009·0 cites·5 claims
- 4248US7056837B2Process of insulating a semiconductor device using a polymeric materialIBM·Filed 2003·Granted Jun 6, 2006·1 cites·8 claims
- 4344US7332436B2Process of removing residue from a precision surface using liquid or supercritical carbon dioxide compositionIBM·Filed 2004·Granted Feb 19, 2008·0 cites·14 claims
- 4443US6997197B2Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluidIBM·Filed 2002·Granted Feb 14, 2006·0 cites·9 claims
- 4542US2004038155A1Topcoat process to prevent image collapseFiled 2003·Application pending·0 cites
- 4642US2005087490A1Process for removing impurities from low dielectric constant films disposed on semiconductor devicesIBM·Filed 2003·Application pending·0 cites
- 4741US2003008129A1Dielectric material and process of insulating a semiconductor device using sameIBM·Filed 2001·Application pending·0 cites
- 4839US2003019528A1Check valve for micro electro mechanical structure devicesIBM·Filed 2001·Application pending·0 cites
- 4937US2003196679A1Process and apparatus for contacting a precision surface with liquid or supercritical carbon dioxideIBM·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →