Inventor · disambiguated record
Kenji Ohtoshi
Also filed as: OHTOSHI KENJI
12 granted patents·93 citations·filing 1994–2015
88Inventor score
Top patents by PatentIndex Score
12 records- 0188US5539211ACharged beam apparatus having cleaning function and method of cleaning charged beam apparatusTOSHIBA KK·Filed 1994·Granted Jul 23, 1996·56 cites·30 claims
- 0286US9190245B2Charged particle beam writing apparatus, and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2015·Granted Nov 17, 2015·6 cites·11 claims
- 0384US7679068B2Method of calculating deflection aberration correcting voltage and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Mar 16, 2010·8 cites·14 claims
- 0482US9466461B2Rotation angle measuring method of multi-charged particle beam image, rotation angle adjustment method of multi-charged particle beam image, and multi-charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2015·Granted Oct 11, 2016·3 cites·10 claims
- 0571US7476881B2Charged beam drawing apparatus and charged beam drawing methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Jan 13, 2009·3 cites·16 claims
- 0666US9653262B2Method of measuring beam position of multi charged particle beam, and multi charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2015·Granted May 16, 2017·1 cites·10 claims
- 0763US9472372B2Charged particle beam writing apparatus and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2015·Granted Oct 18, 2016·1 cites·13 claims
- 0863US8008631B2Method of acquiring offset deflection amount for shaped beam and lithography apparatusNUFLARE TECHNOLOGY INC·Filed 2009·Granted Aug 30, 2011·1 cites·10 claims
- 0958US8188443B2Focusing method of charged particle beam and astigmatism adjusting method of charged particleOHTOSHI KENJI·Filed 2008·Granted May 29, 2012·2 cites·8 claims
- 1057US5949076ACharged beam applying apparatusTOSHIBA KK·Filed 1997·Granted Sep 7, 1999·12 cites·17 claims
- 1145US8253112B2Lithography apparatus and focusing method for charged particle beamIIZUKA OSAMU·Filed 2009·Granted Aug 28, 2012·0 cites·10 claims
- 1242US7521689B2Deflector for equipment of electron beam lithography and equipment of electron beam lithographyNUFLARE TECHNOLOGY INC·Filed 2007·Granted Apr 21, 2009·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →