Inventor · disambiguated record
Kenichi Oikawa
Also filed as: OIKAWA KENICHI
9 granted patents·2 pending applications·22 citations·filing 1997–2023
81Inventor score
Top patents by PatentIndex Score
11 records- 0195US11693314B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 4, 2023·4 cites·19 claims
- 0291US12050402B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 30, 2024·2 cites·17 claims
- 0383US12072627B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2023·Granted Aug 27, 2024·0 cites·12 claims
- 0483US10131730B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 20, 2018·2 cites·12 claims
- 0568US9411225B2Photo acid generator, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Aug 9, 2016·1 cites·19 claims
- 0657US11762287B2Onium salt compound, chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Sep 19, 2023·0 cites·19 claims
- 0753US2021188770A1Onium salt compound, chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Application pending·0 cites
- 0851US11448962B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Sep 20, 2022·0 cites·14 claims
- 0947US11662663B2Substrate protective film-forming composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted May 30, 2023·0 cites·15 claims
- 1045US6173959B1Diaphragm-holding synthetic resin assemblyMIKUNI ADEC CORP·Filed 1997·Granted Jan 16, 2001·13 cites·10 claims
- 1134US2015346600A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →