Inventor · disambiguated record
Kenneth H. Purser
Also filed as: PURSER KENNETH · PURSER KENNETH H · PURSER KENNETH HARRY
44 granted patents·3 pending applications·920 citations·filing 1976–2014
98Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT10HIGH VOLTAGE ENG EUROP7PURSER KENNETH H6GEN IONEX CORP4TWIN CREEKS TECHNOLOGIES INC3
Top patents by PatentIndex Score
47 records- 0196US7989784B2Ion implantation apparatus and a methodTWIN CREEKS TECHNOLOGIES INC·Filed 2009·Granted Aug 2, 2011·30 cites·27 claims
- 0295US8101488B1Hydrogen implantation with reduced radiationSMICK THEODORE H·Filed 2010·Granted Jan 24, 2012·32 cites·23 claims
- 0395US7301156B2Controlling the characteristics of implanter ion-beamsPURSER KENNETH H·Filed 2005·Granted Nov 27, 2007·25 cites·19 claims
- 0495US6933507B2Controlling the characteristics of implanter ion-beamsFiled 2003·Granted Aug 23, 2005·43 cites·14 claims
- 0595US5661299AMiniature AMS detector for ultrasensitive detection of individual carbon-14 and tritium atomsHIGH VOLTAGE ENG EUROP·Filed 1996·Granted Aug 26, 1997·104 cites·13 claims
- 0695US4037100AUltra-sensitive spectrometer for making mass and elemental analysesGEN IONEX CORP·Filed 1976·Granted Jul 19, 1977·49 cites·4 claims
- 0792US8044374B2Ion implantation apparatusTWIN CREEKS TECHNOLOGIES INC·Filed 2009·Granted Oct 25, 2011·25 cites·27 claims
- 0892US7982197B2Ion implantation apparatus and a method for fluid coolingTWIN CREEKS TECHNOLOGIES INC·Filed 2009·Granted Jul 19, 2011·19 cites·7 claims
- 0992US4553069AWafer holding apparatus for ion implantationGEN IONEX CORP·Filed 1984·Granted Nov 12, 1985·96 cites·23 claims
- 1091US8058626B2Method and apparatus for modifying a ribbon-shaped ion beamPURSER KENNETH HARRY·Filed 2010·Granted Nov 15, 2011·16 cites·18 claims
- 1190US5438194AUltra-sensitive molecular identifierHIGH VOLTAGE ENG EUROP·Filed 1993·Granted Aug 1, 1995·101 cites·14 claims
- 1289US7525103B2Technique for improving uniformity of a ribbon beamVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Apr 28, 2009·14 cites·20 claims
- 1388US7888660B2Controlling the characteristics of implanter ion-beamsPURSER KENNETH H·Filed 2006·Granted Feb 15, 2011·8 cites·32 claims
- 1488US7351984B2Controlling the characteristics of implanter ion-beamsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Apr 1, 2008·7 cites·11 claims
- 1588US4973841APrecision ultra-sensitive trace detector for carbon-14 when it is at concentration close to that present in recent organic materialsGENUS INC·Filed 1990·Granted Nov 27, 1990·72 cites·1 claims
- 1686US7675047B2Technique for shaping a ribbon-shaped ion beamVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Mar 9, 2010·9 cites·20 claims
- 1786US5825038ALarge area uniform ion beam formationEATON CORP·Filed 1996·Granted Oct 20, 1998·49 cites·55 claims
- 1882US7807983B2Technique for reducing magnetic fields at an implant locationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Oct 5, 2010·8 cites·16 claims
- 1982US7414249B2Broad energy-range ribbon ion beam collimation using a variable-gradient dipolePURSER KENNETH H·Filed 2005·Granted Aug 19, 2008·5 cites·20 claims
- 2080US8884244B1Dual mode ion implanterVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Nov 11, 2014·4 cites·13 claims
- 2176US7439526B2Beam neutralization in low-energy high-current ribbon-beam implantersVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Oct 21, 2008·3 cites·42 claims
- 2275US7897943B2Controlling the characteristics of implanter ion-beamsPURSER KENNETH H·Filed 2006·Granted Mar 1, 2011·2 cites·31 claims
- 2375US5907158ABroad range ion implanterEBARA CORP·Filed 1997·Granted May 25, 1999·30 cites·8 claims
- 2473US7829866B2Broad energy-range ribbon ion beam collimation using a variable-gradient dipolePURSER KENNETH H·Filed 2008·Granted Nov 9, 2010·2 cites·37 claims
- 2568US8466431B2Techniques for improving extracted ion beam quality using high-transparency electrodesBUFF JAMES S·Filed 2009·Granted Jun 18, 2013·3 cites·20 claims
- 2666US4775796ATreating workpieces with beamsPURSER KENNETH H·Filed 1987·Granted Oct 4, 1988·13 cites·3 claims
- 2765US8309935B2End terminations for electrodes used in ion implantation systemsSINCLAIR FRANK·Filed 2009·Granted Nov 13, 2012·1 cites·2 claims
- 2865US5621209AAttomole detectorHIGH VOLTAGE ENG EUROP·Filed 1995·Granted Apr 15, 1997·18 cites·13 claims
- 2964US8993980B1Dual stage scanner for ion beam controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Mar 31, 2015·1 cites·18 claims
- 3060US7365340B2Resonance method for production of intense low-impurity ion beams of atoms and moleculesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2005·Granted Apr 29, 2008·2 cites·31 claims
- 3159US8089050B2Method and apparatus for modifying a ribbon-shaped ion beamPURSER KENNETH HARRY·Filed 2009·Granted Jan 3, 2012·0 cites·29 claims
- 3258US5120956AAcceleration apparatus which reduced backgrounds of accelerator mass spectrometry measurements of 14 C and other radionuclidesHIGH VOLTAGE ENG EUROP·Filed 1991·Granted Jun 9, 1992·13 cites·2 claims
- 3355US5693939AMeV neutral beam ion implanterFiled 1996·Granted Dec 2, 1997·24 cites·14 claims
- 3455US5569915ASensitive mass spectroscopy using molecular fragmentationFiled 1995·Granted Oct 29, 1996·16 cites·11 claims
- 3551US5391870AHigh-speed precision mass selection systemHIGH VOLTAGE ENG EUROP·Filed 1993·Granted Feb 21, 1995·9 cites·15 claims
- 3650US5118936AAccuracy of AMS isotopic ratio measurementsHIGH VOLTAGE ENGINEEERING EURO·Filed 1991·Granted Jun 2, 1992·11 cites·2 claims
- 3750US2009121122A1Techniques for measuring and controlling ion beam angle and density uniformityVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 3848US9029811B1Apparatus to control an ion beamVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted May 12, 2015·0 cites·16 claims
- 3945US5719403AMeV scanning ions implanterFiled 1997·Granted Feb 17, 1998·13 cites·11 claims
- 4045US5247263AInjection system for tandem acceleratorsHIGH VOLTAGE ENG EUROP·Filed 1991·Granted Sep 21, 1993·10 cites·6 claims
- 4145US4967078ARutherford backscattering surface analyzer with 180-degree deflecting and focusing permanent magnetGENUS INC·Filed 1990·Granted Oct 30, 1990·7 cites·1 claims
- 4241US5828070ASystem and method for cooling workpieces processed by an ion implantation systemEATON CORP·Filed 1996·Granted Oct 27, 1998·8 cites·73 claims
- 4340US5237174ASingle atom detection of chlorine-36 by triple-stage accelerator mass spectrometryHIGH VOLTAGE ENG EUROP·Filed 1991·Granted Aug 17, 1993·9 cites·5 claims
- 4440US2004149926A1Emittance measuring device for ion beamsFiled 2003·Application pending·0 cites
- 4539US4616157AInjector for negative ionsGEN IONEX CORP·Filed 1985·Granted Oct 7, 1986·7 cites·10 claims
- 4638US2003197133A1Method and apparatus for scanning a workpiece in a vacuum chamberFiled 2003·Application pending·0 cites
- 4731US4173712AElectrical circuit component protecting deviceGEN IONEX CORP·Filed 1978·Granted Nov 6, 1979·2 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →