Inventor · disambiguated record
Kevin Shipley
Also filed as: SHIPLEY KEVIN · SHIPLEY KEVIN D
5 granted patents·4 pending applications·130 citations·filing 1997–2024
83Inventor score
Top patents by PatentIndex Score
9 records- 0180US6106661APolishing pad having a wear level indicator and system using the sameADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 22, 2000·48 cites·42 claims
- 0270US6331137B1Polishing pad having open area which varies with distance from initial pad surfaceADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 18, 2001·34 cites·23 claims
- 0361US6051495ASeasoning of a semiconductor wafer polishing pad to polish tungstenADVANCED MICRO DEVICES INC·Filed 1997·Granted Apr 18, 2000·25 cites·57 claims
- 0457US2024345015A1Systems and processes for determining drying times for granulate materials based on initial moisture content of the materialsNOVATEC INC·Filed 2024·Application pending·0 cites
- 0554US2010000036A1Game Feeder Cleaning DeviceSHIPLEY KEVIN·Filed 2008·Application pending·0 cites
- 0649US5966766AApparatus and method for cleaning semiconductor waferADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 19, 1999·13 cites·14 claims
- 0745US6110294AApparatus and method for cleaning semiconductor waferADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 29, 2000·10 cites·28 claims
- 0834US2002127957A1Chemical mechanical polish pad conditioning deviceFiled 2000·Application pending·0 cites
- 0932US2003027504A1Chemical mechanical polish pad conditioning deviceFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →