Inventor · disambiguated record
Keishi Tsukiyama
Also filed as: TSUKIYAMA KEISHI
3 granted patents·4 pending applications·0 citations·filing 2023–2025
49Inventor score
Files withAGC INC7
Top patents by PatentIndex Score
7 records- 0184US12298660B2Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing sameAGC INC·Filed 2024·Granted May 13, 2025·0 cites·20 claims
- 0281US11953822B2Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing sameAGC INC·Filed 2023·Granted Apr 9, 2024·0 cites·18 claims
- 0379US12124164B2Reflective mask blank and reflective maskAGC INC·Filed 2024·Granted Oct 22, 2024·0 cites·7 claims
- 0479US2025216765A1Reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing sameAGC INC·Filed 2025·Application pending·0 cites
- 0577US2025004360A1Reflective mask blank and reflective maskAGC INC·Filed 2024·Application pending·0 cites
- 0659US2025065403A1Method for producing magnetic particles, magnetic particles, and permanent magnet using the sameAGC INC·Filed 2024·Application pending·0 cites
- 0753US2025155793A1Reflective mask blank for euv lithography, method for manufacturing same, reflective mask for euv lithography, and method for manufacturing sameAGC INC·Filed 2025·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →