Inventor · disambiguated record
Kevin W. Wenzel
Also filed as: WENZEL KEVIN · WENZEL KEVIN W · WENZEL KEVIN WAYNE
17 granted patents·8 pending applications·187 citations·filing 1998–2025
93Inventor score
Top patents by PatentIndex Score
25 records- 0195US11222770B2Microwave applicator with solid-state generator power sourceMKS INSTR INC·Filed 2020·Granted Jan 11, 2022·10 cites·10 claims
- 0290US11024489B2Method and apparatus for deposition cleaning in a pumping lineMKS INSTR INC·Filed 2019·Granted Jun 1, 2021·4 cites·11 claims
- 0389US10790118B2Microwave applicator with solid-state generator power sourceMKS INSTR INC·Filed 2017·Granted Sep 29, 2020·7 cites·33 claims
- 0489US6903350B1Ion beam scanning systems and methods for improved ion implantation uniformityAXCELIS TECH INC·Filed 2004·Granted Jun 7, 2005·46 cites·45 claims
- 0588US10535506B2Method and apparatus for deposition cleaning in a pumping lineMKS INSTR INC·Filed 2017·Granted Jan 14, 2020·4 cites·21 claims
- 0685US10940635B2Method and apparatus for processing dielectric materials using microwave energyMKS INSTR INC·Filed 2018·Granted Mar 9, 2021·2 cites·19 claims
- 0785US10071521B2Method and apparatus for processing dielectric materials using microwave energyMKS INSTR INC·Filed 2015·Granted Sep 11, 2018·2 cites·18 claims
- 0884US10505348B2Apparatus and method for ignition of a plasma system and for monitoring health of the plasma systemMKS INSTR INC·Filed 2017·Granted Dec 10, 2019·3 cites·48 claims
- 0983USD616097SDental implant abutment3M INNOVATIVE PROPERTIES CO·Filed 2009·Granted May 18, 2010·34 cites·1 claims
- 1082US11367598B2Method and apparatus for deposition cleaning in a pumping lineMKS INSTR INC·Filed 2020·Granted Jun 21, 2022·1 cites·21 claims
- 1179US7064340B1Method and apparatus for ion beam profilingAXCELIS TECH INC·Filed 2004·Granted Jun 20, 2006·13 cites·16 claims
- 1278US6891174B2Method and system for ion beam containment using photoelectrons in an ion beam guideAXCELIS TECH INC·Filed 2003·Granted May 10, 2005·14 cites·49 claims
- 1376US9653266B2Microwave plasma applicator with improved power uniformityMKS INSTR INC·Filed 2015·Granted May 16, 2017·3 cites·51 claims
- 1472US6137112ATime of flight energy measurement apparatus for an ion beam implanterEATON CORP·Filed 1998·Granted Oct 24, 2000·44 cites·24 claims
- 1569US2025207239A1Liquid metal alloy feed materials for ion implantationAXCELIS TECH INC·Filed 2024·Application pending·0 cites
- 1664US2018233333A1Toroidal plasma abatement apparatus and methodMKS INSTR INC·Filed 2018·Application pending·0 cites
- 1763US9991098B2Toroidal plasma abatement apparatus and methodMKS INSTR INC·Filed 2017·Granted Jun 5, 2018·0 cites·9 claims
- 1862US10910798B2Apparatus and method for ignition of a plasma system and for monitoring health of the plasma systemMKS INSTR INC·Filed 2019·Granted Feb 2, 2021·0 cites·16 claims
- 1959US9630142B2Toroidal plasma abatement apparatus and methodMKS INSTR INC·Filed 2014·Granted Apr 25, 2017·0 cites·9 claims
- 2058US2025259816A1Ion stripping apparatus and ion implantation system with selectable stripping gas sourceAXCELIS TECH INC·Filed 2025·Application pending·0 cites
- 2149US2023140789A1Robust network connectivity leveraging edge computeLEVEL 3 COMMUNICATIONS LLC·Filed 2022·Application pending·0 cites
- 2244US2018195196A1Protective oxide coating with reduced metal concentrationsMKS INSTR INC·Filed 2017·Application pending·0 cites
- 2341US2015279626A1Microwave plasma applicator with improved power uniformityMKS INSTR INC·Filed 2014·Application pending·0 cites
- 2440US2006017010A1Magnet for scanning ion beamsAXCELIS TECH INC·Filed 2004·Application pending·0 cites
- 2538US2013146225A1Gas injector apparatus for plasma applicatorCHEN XING·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Kevin W. Wenzel files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →