Inventor · disambiguated record
Ken'Etsu Yokogawa
Also filed as: YOKOGAWA KEN ETSU
15 granted patents·8 pending applications·201 citations·filing 1992–2018
93Inventor score
Top patents by PatentIndex Score
23 records- 0191US5891252APlasma processing apparatusHITACHI LTD·Filed 1996·Granted Apr 6, 1999·60 cites·30 claims
- 0289US6551445B1Plasma processing system and method for manufacturing a semiconductor device by using the sameHITACHI LTD·Filed 2000·Granted Apr 22, 2003·50 cites·32 claims
- 0386US9960014B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2016·Granted May 1, 2018·4 cites·14 claims
- 0486US6033481APlasma processing apparatusHITACHI LTD·Filed 1999·Granted Mar 7, 2000·41 cites·23 claims
- 0585US10418224B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2018·Granted Sep 17, 2019·3 cites·8 claims
- 0684US7771564B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Aug 10, 2010·10 cites·6 claims
- 0775US8569647B2Heat treatment apparatusMIYAKE MASATOSHI·Filed 2011·Granted Oct 29, 2013·5 cites·14 claims
- 0873US9490104B2Heat treatment apparatusYOKOGAWA KEN'ETSU·Filed 2012·Granted Nov 8, 2016·3 cites·5 claims
- 0973US7838792B2Plasma processing apparatus capable of adjusting temperature of sample standHITACHI HIGH TECH CORP·Filed 2006·Granted Nov 23, 2010·4 cites·3 claims
- 1072US9271341B2Heat treatment apparatus that performs defect repair annealingYOKOGAWA KEN ETSU·Filed 2010·Granted Feb 23, 2016·3 cites·8 claims
- 1172US8809727B2Heat treatment apparatusYOKOGAWA KEN ETSU·Filed 2011·Granted Aug 19, 2014·3 cites·7 claims
- 1269US10665448B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Granted May 26, 2020·2 cites·17 claims
- 1364US8034181B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Oct 11, 2011·2 cites·16 claims
- 1456US2009008363A1Plasma processing apparatus and a plasma processing methodTAKAHASHI KAZUE·Filed 2008·Application pending·0 cites
- 1551US2006157449A1Plasma processing apparatus and a plasma processing methodTAKAHASHI KAZUE·Filed 2006·Application pending·0 cites
- 1650US2013087285A1Plasma etching apparatusKOFUJI NAOYUKI·Filed 2012·Application pending·0 cites
- 1749US2006096706A1Dry etching apparatus and a method of manufacturing a semiconductor deviceHITACHI LTD·Filed 2005·Application pending·0 cites
- 1844US2014305915A1Heat treatment apparatusHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
- 1943US2014008352A1Heat treatment apparatusHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 2041US2014202995A1Plasma heat treatment apparatusHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 2140US7048869B2Plasma processing apparatus and a plasma processing methodHITACHI LTD·Filed 1999·Granted May 23, 2006·6 cites·9 claims
- 2238US2013277354A1Method and apparatus for plasma heat treatmentMIYAKE MASATOSHI·Filed 2012·Application pending·0 cites
- 2336US5291145AMicrowave processing equipmentHITACHI LTD·Filed 1992·Granted Mar 1, 1994·5 cites·14 claims
Join the waitlist — get patent alerts
Get an alert when Ken'Etsu Yokogawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →