Inventor · disambiguated record
Ki Soo Shin
Also filed as: SHIN KI S · SHIN KI SOO
33 granted patents·3 pending applications·1,128 citations·filing 1995–2020
96Inventor score
Files withHYNIX SEMICONDUCTOR INC27CHUN DONG-WAN2DAEGUNTECH CO LTD2DONGJIN SEMICHEM CO LTD2HYUNDAI ELECTRONICS IND2
Top patents by PatentIndex Score
36 records- 0198US7238653B2Cleaning solution for photoresist and method for forming pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Jul 3, 2007·464 cites·23 claims
- 0298US6924078B2Photoresist monomers, polymers and photoresist compositions for preventing acid diffusionDONGJIN SEMICHEM CO LTD·Filed 2002·Granted Aug 2, 2005·463 cites·17 claims
- 0398US6916594B2Overcoating composition for photoresist and method for forming photoresist pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Jul 12, 2005·128 cites·16 claims
- 0471US7175974B2Organic anti-reflective coating composition and method for forming photoresist patterns using the sameHYNIX SEMICONDUCTOR INC·Filed 2006·Granted Feb 13, 2007·1 cites·5 claims
- 0562US9184479B2Multi mode filter for realizing wide band using capacitive coupling / inductive coupling and capable of tuning coupling valueCHUN DONG-WAN·Filed 2012·Granted Nov 10, 2015·2 cites·15 claims
- 0659US6806025B2Photoresist monomers, polymers thereof and photoresist compositons containing the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Oct 19, 2004·3 cites·23 claims
- 0758US7563753B2Cleaning solution for removing photoresistHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jul 21, 2009·2 cites·15 claims
- 0858US7022458B2Photoresist polymer and photoresist composition containing the sameDONGJIN SEMICHEM CO LTD·Filed 2003·Granted Apr 4, 2006·5 cites·20 claims
- 0958US6858371B2Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Feb 22, 2005·5 cites·21 claims
- 1057US6753128B2Photoresist additive for preventing acid migration and photoresist composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jun 22, 2004·4 cites·4 claims
- 1156US6613493B2Photoresist polymer and composition having nitro groupsHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Sep 2, 2003·4 cites·19 claims
- 1253US7108957B2Organic anti-reflective coating composition and method for forming photoresist patterns using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Sep 19, 2006·1 cites·11 claims
- 1353US7056872B2Solution composition for removing a remaining photoresist resinHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jun 6, 2006·2 cites·10 claims
- 1453US6875956B2Method of forming photoresist pattern using hot plate ovenHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Apr 5, 2005·3 cites·7 claims
- 1553US6653047B2Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Nov 25, 2003·10 cites·21 claims
- 1651US7235349B2Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generatorHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Jun 26, 2007·0 cites·16 claims
- 1751US7205089B2Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Apr 17, 2007·1 cites·15 claims
- 1851US6787285B2Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generatorHYNIX SEMICONDUCTOR INC·Filed 2001·Granted Sep 7, 2004·4 cites·17 claims
- 1950US6921622B2Photoresist monomers, polymers thereof and photoresist compositions containing the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jul 26, 2005·1 cites·12 claims
- 2048US6841526B2Cleaning solution for removing photoresistHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jan 11, 2005·1 cites·17 claims
- 2147US6737217B2Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted May 18, 2004·1 cites·19 claims
- 2247US5614429AMethod for fabricating EEPROM with control gate in touch with select gateHYUNDAI ELECTRONICS IND·Filed 1995·Granted Mar 25, 1997·10 cites·3 claims
- 2346US6849375B2Photoresist monomers, polymers thereof and photoresist compositions containing the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Feb 1, 2005·1 cites·12 claims
- 2444US12042863B23D printer with residual powder removal deviceDAEGUNTECH CO LTD·Filed 2020·Granted Jul 23, 2024·0 cites·5 claims
- 2543US9077063B2Wide-band multi-mode filterCHUN DONG-WAN·Filed 2012·Granted Jul 7, 2015·0 cites·5 claims
- 2643US6998442B2Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereofHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Feb 14, 2006·0 cites·18 claims
- 2743US5710735AEEPROM and method for fabricating the sameHYUNDAI ELECTRONICS IND·Filed 1996·Granted Jan 20, 1998·7 cites·4 claims
- 2842US7138218B2Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generatorHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Nov 21, 2006·0 cites·15 claims
- 2942US2002128410A1Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereofFiled 2002·Application pending·0 cites
- 3040US6720129B2Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Apr 13, 2004·3 cites·18 claims
- 3139US7220679B2Method for forming patterns in a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2003·Granted May 22, 2007·0 cites·9 claims
- 3238US7198887B2Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2004·Granted Apr 3, 2007·0 cites·10 claims
- 3338US6764964B2Method for forming patterns of a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jul 20, 2004·0 cites·10 claims
- 3438US6749990B2Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the sameHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Jun 15, 2004·2 cites·24 claims
- 3537US2002197817A1Methods for forming a capacitor of a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2002·Application pending·0 cites
- 3632US2018137679A1Stl file coupling methodDAEGUNTECH CO LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →