Inventor · disambiguated record
Kikurou Takemoto
Also filed as: TAKEMOTO KIKUROU
6 granted patents·3 pending applications·53 citations·filing 1995–2008
81Inventor score
Top patents by PatentIndex Score
9 records- 0175US7518216B2Gallium nitride baseplate, epitaxial substrate, and method of forming gallium nitrideSUMITOMO ELECTRIC INDUSTRIES·Filed 2006·Granted Apr 14, 2009·4 cites·1 claims
- 0275US7195022B2Production apparatus for producing gallium nitride semiconductor film and cleaning apparatus for exhaust gasSUMITOMO ELECTRIC INDUSTRIES·Filed 2005·Granted Mar 27, 2007·2 cites·3 claims
- 0364US5843590AEpitaxial wafer and method of preparing the sameSUMITOMO ELECTRIC INDUSTRIES·Filed 1995·Granted Dec 1, 1998·32 cites·2 claims
- 0457US7843040B2Gallium nitride baseplate and epitaxial substrateSUMITOMO ELECTRIC INDUSTRIES·Filed 2008·Granted Nov 30, 2010·0 cites·4 claims
- 0557US2007128359A1Production apparatus for producing gallium nitride film semiconductor and cleaning apparatus for exhaust gasSUMITOMO ELECTRIC INDUSTIRES L·Filed 2007·Application pending·0 cites
- 0653US2007292612A1Metal-organic vaporizing and feeding apparatus, metal-organic chemical vapor deposition apparatus, metal-organic chemical vapor deposition method, gas flow rate regulator, semiconductor manufacturing apparatus, and semiconductor manufacturing methodSOKEN IND·Filed 2007·Application pending·0 cites
- 0751US6387722B1Methods for preparing an epitaxial wafer having a gallium nitride epitaxial layer deposited on a semiconductor substrateSUMITOMO ELECTRIC INDUSTRIES·Filed 2000·Granted May 14, 2002·3 cites·11 claims
- 0849US6270587B1Epitaxial wafer having a gallium nitride epitaxial layer deposited on semiconductor substrate and method for preparing the sameSUMITOMO ELECTRIC INDUSTRIES·Filed 1998·Granted Aug 7, 2001·12 cites·11 claims
- 0942US2002136671A1Production apparatus for producing gallium nitride film semiconductor and cleaning apparatus for exhaust gasJAPAN PIONICS·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →