Inventor · disambiguated record
Kousuke Doi
Also filed as: DOI KOUSUKE
33 granted patents·6 pending applications·264 citations·filing 1993–2007
97Inventor score
Top patents by PatentIndex Score
39 records- 0186US5434031APositive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additiveTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jul 18, 1995·16 cites·9 claims
- 0284US6517993B2Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Feb 11, 2003·25 cites·16 claims
- 0365US6296992B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Oct 2, 2001·6 cites·7 claims
- 0464US5601961AHigh-sensitivity positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Feb 11, 1997·24 cites·44 claims
- 0562US7060410B2Novolak resin solution, positive photoresist composition and preparation method thereofTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Jun 13, 2006·6 cites·3 claims
- 0660US6207340B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Mar 27, 2001·4 cites·6 claims
- 0759US6312863B1Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Nov 6, 2001·5 cites·12 claims
- 0858US5501936APositive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compoundTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 26, 1996·15 cites·11 claims
- 0957US6762005B2Positive photoresist composition and method of patterning resist thin film for use in inclined implantation processTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 13, 2004·5 cites·6 claims
- 1056US5478692APositive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenoneTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Dec 26, 1995·13 cites·10 claims
- 1155US6120969APolyphenol compound, quinonediazide ester and positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Sep 19, 2000·14 cites·5 claims
- 1254US7358028B2Chemically amplified positive photo resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 15, 2008·10 cites·10 claims
- 1354US6475694B2Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl groupTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Nov 5, 2002·4 cites·8 claims
- 1454US5853948APositive photoresist compositions and multilayer resist materials using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 29, 1998·15 cites·10 claims
- 1553US6566031B1Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist patternTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted May 20, 2003·3 cites·11 claims
- 1653US6379859B2Positive photoresist composition and process for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Apr 30, 2002·12 cites·17 claims
- 1752US6187500B1Positive photoresist compositions and multilayer resist materials using sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Feb 13, 2001·13 cites·11 claims
- 1851US6869742B2Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 22, 2005·5 cites·6 claims
- 1951US6756178B2Positive photoresist composition and method of patterning resist thin film for use in inclined implantation processTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jun 29, 2004·3 cites·7 claims
- 2049US6939926B2Phenol novolak resin, production process thereof, and positive photoresist composition using the sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 6, 2005·2 cites·1 claims
- 2147US5384228AAlkali-developable positive-working photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jan 24, 1995·8 cites·7 claims
- 2246US6177226B1Positive photoresist composition and process for forming contact holeTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jan 23, 2001·7 cites·2 claims
- 2344US6207788B1Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resinTOKYO OHKA KOGYA CO LTD·Filed 1998·Granted Mar 27, 2001·8 cites·1 claims
- 2444US6030741APositive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Feb 29, 2000·8 cites·2 claims
- 2543US5738968APositive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Apr 14, 1998·8 cites·8 claims
- 2642US2004137359A1Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 2741US6964838B2Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 15, 2005·0 cites·4 claims
- 2841US6300033B1Positive photoresist composition and process for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Oct 9, 2001·6 cites·6 claims
- 2940US2002119390A1Positive photoresist composition and process for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Application pending·0 cites
- 3039US5702861APositive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 30, 1997·5 cites·9 claims
- 3139US5401605APositive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compoundTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 28, 1995·5 cites·14 claims
- 3238US6127087APositive photoresist compositions and multilayer resist materials using sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Oct 3, 2000·5 cites·10 claims
- 3338US2002031720A1Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2001·Application pending·0 cites
- 3437US6406827B2Positive photoresist composition and process for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jun 18, 2002·4 cites·4 claims
- 3536US2001024762A1Phenol novolak resin, production process thereof, and positive photoresist composition using the sameFiled 2001·Application pending·0 cites
- 3634US2007117045A1Chemical amplification type positive photoresist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 3732US6884566B2Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Apr 26, 2005·0 cites·9 claims
- 3830US2003186171A1Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 3922US6417317B1Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resinTOGYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 9, 2002·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →