Inventor · disambiguated record
Koichi Kitahara
Also filed as: KITAHARA KOICHI
18 granted patents·3 pending applications·442 citations·filing 1982–2022
95Inventor score
Top patents by PatentIndex Score
21 records- 0184US4996030AMethod for cleaning exhaust gasesJAPAN PIONICS·Filed 1988·Granted Feb 26, 1991·40 cites·6 claims
- 0283US5261241ARefrigerantJAPAN PIONICS·Filed 1992·Granted Nov 16, 1993·58 cites·22 claims
- 0380US5194233AProcess for purification of rare gasJAPAN PIONICS·Filed 1991·Granted Mar 16, 1993·35 cites·4 claims
- 0476US4743435AMethod for cleaning exhaust gasesJAPAN PIONICS·Filed 1985·Granted May 10, 1988·30 cites·6 claims
- 0575US5493148ASemiconductor device whose output characteristic can be adjusted by functional trimmingTOSHIBA KK·Filed 1992·Granted Feb 20, 1996·52 cites·10 claims
- 0673US4948748AManufacture of a substrate structure for a composite semiconductor device using wafer bonding and epitaxial refillTOSHIBA KK·Filed 1989·Granted Aug 14, 1990·42 cites·7 claims
- 0772US4910001AMethod for cleaning gas containing toxic componentJAPAN PIONICS·Filed 1988·Granted Mar 20, 1990·34 cites·22 claims
- 0872US4879584ASemiconductor device with isolation between MOSFET and control circuitTOSHIBA KK·Filed 1988·Granted Nov 7, 1989·29 cites·10 claims
- 0962US4976942AMethod for purifying gaseous hydridesJAPAN PIONICS·Filed 1989·Granted Dec 11, 1990·13 cites·7 claims
- 1060US5670445ACleaning agent of harmful gas and cleaning methodJAPAN PIONICS·Filed 1995·Granted Sep 23, 1997·25 cites·8 claims
- 1157US5294422AProcess for purification of rare gasJAPAN PIONICS·Filed 1992·Granted Mar 15, 1994·13 cites·4 claims
- 1254US4985745ASubstrate structure for composite semiconductor deviceTOSHIBA KK·Filed 1989·Granted Jan 15, 1991·22 cites·8 claims
- 1351US4398040AProcess for producing trimellitic acidMITSUBISHI GAS CHEMICAL CO·Filed 1982·Granted Aug 9, 1983·4 cites·14 claims
- 1451US2025006799A1Semiconductor substrate, semiconductor device, method for producing semiconductor substrate, and method for producing semiconductor deviceAIR WATER INC·Filed 2022·Application pending·0 cites
- 1548US2024290843A1Semiconductor element and production method for semiconductor elementAIR WATER INC·Filed 2022·Application pending·0 cites
- 1646US6740565B2Process for fabrication of a SIMOX substrateNIPPON STEEL CORP·Filed 2002·Granted May 25, 2004·2 cites·6 claims
- 1744US5418383ASemiconductor device capable of previously evaluating characteristics of power output elementTOSHIBA KK·Filed 1993·Granted May 23, 1995·10 cites·9 claims
- 1844US5019364AMethod for purifying gaseous hydridesJAPAN PIONICS·Filed 1990·Granted May 28, 1991·7 cites·7 claims
- 1937US5429762ACooling agentJAPAN PIONICS·Filed 1993·Granted Jul 4, 1995·22 cites·18 claims
- 2036US2001021593A1Chemical vapor deposition apparatus and chemical vapor deposition processJAPAN PIONICS·Filed 2001·Application pending·0 cites
- 2135US4731333AMethod for detecting gaseous hydridesJAPAN PIONICS·Filed 1986·Granted Mar 15, 1988·4 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →