Inventor · disambiguated record
Koji Kuwana
Also filed as: KUWANA KOJI
9 granted patents·2 pending applications·72 citations·filing 1989–2011
86Inventor score
Top patents by PatentIndex Score
11 records- 0167US5059507APositive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resinSUMITOMO CHEMICAL CO·Filed 1989·Granted Oct 22, 1991·18 cites·20 claims
- 0259US5080997AProcess for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixtureSUMITOMO CHEMICAL CO·Filed 1989·Granted Jan 14, 1992·13 cites·22 claims
- 0358US8557410B2Secondary battery with a spirally-rolled electrode groupMATSUMOTO ISAO·Filed 2009·Granted Oct 15, 2013·0 cites·14 claims
- 0454US5290656AResist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compoundSUMITOMO CHEMICAL CO·Filed 1993·Granted Mar 1, 1994·12 cites·10 claims
- 0552US5378586AResist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete esterSUMITOMO CHEMICAL CO·Filed 1993·Granted Jan 3, 1995·11 cites·14 claims
- 0648US9299986B2Method for manufacturing metal-made three-dimensional substrate for electrodes, metal-made three-dimensional substrate for electrodes and electrochemical applied products using the sameMATSUMOTO ISAO·Filed 2011·Granted Mar 29, 2016·0 cites·3 claims
- 0748US5124228APositive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid esterSUMITOMO CHEMICAL CO·Filed 1989·Granted Jun 23, 1992·8 cites·15 claims
- 0842US5283324AProcess for preparing radiation sensitive compound and positive resist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Feb 1, 1994·6 cites·11 claims
- 0940US2006073411A1Chemically amplified resist compositionSUMITOMO CHEMICAL CO·Filed 2005·Application pending·0 cites
- 1037US5413895APositive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound.SUMITOMO CHEMICAL CO·Filed 1992·Granted May 9, 1995·4 cites·9 claims
- 1135US2003180659A1Resist compositionFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →