Inventor · disambiguated record
Koichi Moriizumi
Also filed as: MORIIZUMI KOICHI
14 granted patents·377 citations·filing 1986–2011
94Inventor score
Top patents by PatentIndex Score
14 records- 0189US6343370B1Apparatus and process for pattern distortion detection for semiconductor process and semiconductor device manufactured by use of the apparatus or processMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jan 29, 2002·84 cites·20 claims
- 0289US6069971APattern comparison inspection system and method employing gray level bit mapMITSUBISHI ELECTRIC CORP·Filed 1997·Granted May 30, 2000·65 cites·17 claims
- 0386US6298473B1Apparatus and method for inhibiting pattern distortions to correct pattern data in a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Oct 2, 2001·69 cites·17 claims
- 0473US8760642B2Substrate inspection apparatus and mask inspection apparatusHORI ZENTA·Filed 2011·Granted Jun 24, 2014·6 cites·27 claims
- 0569US5812412ACharged beam pattern data generating method and a charged beam pattern data generating apparatusMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Sep 22, 1998·24 cites·27 claims
- 0665US6271852B1boundary processing of oblique overlapping graphics to achieve dimensionally accurate electron beam irradiationMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Aug 7, 2001·19 cites·10 claims
- 0763US5086398AElectron beam exposure methodMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Feb 4, 1992·17 cites·3 claims
- 0859US6088520AMethod of producing highly precise charged beam drawing data divided into plurality of drawing fieldsMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Jul 11, 2000·25 cites·22 claims
- 0959US4794646ACharged beam pattern defect inspection apparatusMITSUBISHI ELECTRIC CORP·Filed 1986·Granted Dec 27, 1988·31 cites·10 claims
- 1057US5153441AElectron-beam exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Oct 6, 1992·13 cites·8 claims
- 1147US5008830AMethod of preparing drawing data for charged beam exposure systemMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Apr 16, 1991·17 cites·8 claims
- 1233US4984199ASemiconductor memory cells having common contact holeMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Jan 8, 1991·3 cites·10 claims
- 1330US5796408ACharged particle beam drawing data production apparatus and charged particle beam drawing systemMITSUBISHI ELECTRIC CORP·Filed 1995·Granted Aug 18, 1998·3 cites·12 claims
- 1429US4887137ASemiconductor memory deviceMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Dec 12, 1989·1 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →