Inventor · disambiguated record
Kousuke Ohyama
Also filed as: OHYAMA KOUSUKE
2 granted patents·13 pending applications·0 citations·filing 2021–2025
23Inventor score
Files withSHINETSU CHEMICAL CO15
Top patents by PatentIndex Score
15 records- 0168US12436462B2Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Granted Oct 7, 2025·0 cites·12 claims
- 0267US2025377593A1Resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0367US2025377588A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0463US2025306459A1Resist composition and pattern forming methodSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0563US2025314962A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0663US2025314963A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0763US2025314966A1Resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0863US2025314967A1Resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0963US2025306458A1Resist composition and pattern forming methodSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1062US2025377592A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1160US2024210830A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1258US2023296980A1Resist material and pattern forming methodSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1352US12240804B2Onium salt, chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Mar 4, 2025·0 cites·15 claims
- 1452US2023161255A1Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1549US2025291249A1Resist composition, laminate, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →