Inventor · disambiguated record
Kouhei Sasamoto
Also filed as: SASAMOTO KOUHEI
23 granted patents·2 pending applications·27 citations·filing 2013–2025
91Inventor score
Files withSHINETSU CHEMICAL CO25
Top patents by PatentIndex Score
25 records- 0192US9366951B2Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure methodSHINETSU CHEMICAL CO·Filed 2014·Granted Jun 14, 2016·8 cites·11 claims
- 0290US11971653B2Photomask blank, method for producing photomask, and photomaskSHINETSU CHEMICAL CO·Filed 2020·Granted Apr 30, 2024·3 cites·16 claims
- 0384US10466583B2Halftone phase shift mask blank and halftone phase shift maskSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 5, 2019·2 cites·15 claims
- 0484US9158192B2Half-tone phase shift mask blank and method for manufacturing half-tone phase shift maskSHINETSU CHEMICAL CO·Filed 2013·Granted Oct 13, 2015·4 cites·9 claims
- 0581US9268212B2Photomask blank and method for manufacturing photomaskSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 23, 2016·3 cites·16 claims
- 0681US9188852B2Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift maskSHINETSU CHEMICAL CO·Filed 2013·Granted Nov 17, 2015·3 cites·9 claims
- 0777US10782608B2Method for preparing photomask blank, photomask blank, method for preparing photomask, photomask, and metallic chromium targetSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 22, 2020·1 cites·18 claims
- 0875US9440375B2Blank for mold production and method for manufacturing moldSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 13, 2016·2 cites·14 claims
- 0973US2025253153A1Manufacturing method of photomask, and photomask blankSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1071US10372030B2Halftone phase shift mask blank and halftone phase shift maskSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 6, 2019·1 cites·21 claims
- 1164US12288688B2Manufacturing method of photomask, and photomask blankSHINETSU CHEMICAL CO·Filed 2021·Granted Apr 29, 2025·0 cites·9 claims
- 1264US10989999B2Halftone phase shift mask blank and halftone phase shift maskSHINETSU CHEMICAL CO·Filed 2019·Granted Apr 27, 2021·0 cites·17 claims
- 1359US11774845B2Photomask blank, and manufacturing method thereofSHINETSU CHEMICAL CO·Filed 2021·Granted Oct 3, 2023·0 cites·6 claims
- 1459US2015159264A1Sputter deposition method, sputtering system, manufacture of photomask blank, and photomask blankSHINETSU CHEMICAL CO·Filed 2014·Application pending·0 cites
- 1557US10040220B2Blank for mold production and method for manufacturing moldSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 7, 2018·0 cites·11 claims
- 1654US9541823B2Photomask blankSHINETSU CHEMICAL CO·Filed 2014·Granted Jan 10, 2017·0 cites·24 claims
- 1752US9851633B2Inorganic material film, photomask blank, and method for manufacturing photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Dec 26, 2017·0 cites·9 claims
- 1849US10788747B2Photomask blank and method for producing photomaskSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 29, 2020·0 cites·13 claims
- 1949US9798229B2Designing of photomask blank and photomask blankSHINETSU CHEMICAL CO·Filed 2015·Granted Oct 24, 2017·0 cites·35 claims
- 2048US11143949B2Photomask blank, method of manufacturing photomask, and photomaskSHINETSU CHEMICAL CO·Filed 2019·Granted Oct 12, 2021·0 cites·14 claims
- 2148US11131920B2Photomask blank, and method of manufacturing photomaskSHINETSU CHEMICAL CO·Filed 2019·Granted Sep 28, 2021·0 cites·10 claims
- 2243US9798230B2Photomask blankSHINETSU CHEMICAL CO·Filed 2015·Granted Oct 24, 2017·0 cites·16 claims
- 2341US9880459B2Photomask blank and method for preparing photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Jan 30, 2018·0 cites·7 claims
- 2441US9864269B2Photomask blankSHINETSU CHEMICAL CO·Filed 2016·Granted Jan 9, 2018·0 cites·8 claims
- 2539US9864266B2Photomask blankSHINETSU CHEMICAL CO·Filed 2016·Granted Jan 9, 2018·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →