Inventor · disambiguated record
Koichi Sawahata
Also filed as: SAWAHATA KOICHI
14 granted patents·247 citations·filing 1994–2007
93Inventor score
Top patents by PatentIndex Score
14 records- 0193US5502654AMethod for analyzing light intensity distribution in projection systemsNEC CORP·Filed 1994·Granted Mar 26, 1996·98 cites·20 claims
- 0287US7098510B2Multifinger-type electrostatic discharge protection elementNEC ELECTRONICS CORP·Filed 2004·Granted Aug 29, 2006·35 cites·13 claims
- 0374US7332748B2Electro-static discharge protection deviceNEC ELECTRONICS CORP·Filed 2003·Granted Feb 19, 2008·17 cites·12 claims
- 0472US7875902B2Electro-static discharge protection deviceRENESAS ELECTRONICS CORP·Filed 2007·Granted Jan 25, 2011·4 cites·4 claims
- 0568US7196377B2MOS type semiconductor device having electrostatic discharge protection arrangementNEC ELECTRONICS CORP·Filed 2005·Granted Mar 27, 2007·4 cites·18 claims
- 0656US6624479B2Semiconductor device having a protective circuitNEC ELECTRONICS CORP·Filed 2001·Granted Sep 23, 2003·7 cites·5 claims
- 0743US5999719AIon implantation process simulation device realizing accurate interpolation of ion implantation profiles and simulation method thereforNEC CORP·Filed 1998·Granted Dec 7, 1999·17 cites·16 claims
- 0842US5933359AMethod, apparatus and computer program product for simulating ion implantationNEC CORP·Filed 1998·Granted Aug 3, 1999·15 cites·18 claims
- 0941US5859784AMethod for impurity distribution simulationNEC CORP·Filed 1996·Granted Jan 12, 1999·14 cites·5 claims
- 1041US5737250AMethod and system for simulating ion implantation for performing simulation with avoiding overflow by adjusting memory consuming amountNEC CORP·Filed 1995·Granted Apr 7, 1998·14 cites·12 claims
- 1136US5977551AMethod capable of accurately simulating ion implantation at a high speedNEC CORP·Filed 1997·Granted Nov 2, 1999·8 cites·6 claims
- 1235US5912824AIon implantation simulation methodNEC CORP·Filed 1997·Granted Jun 15, 1999·8 cites·2 claims
- 1332US6684181B1Ion implantation simulation methodNEC ELECTRONICS CORP·Filed 1999·Granted Jan 27, 2004·4 cites·5 claims
- 1430US5932881ASimulation method for high resolution deep impurity profileNEC CORP·Filed 1997·Granted Aug 3, 1999·2 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →