Inventor · disambiguated record
Koichi Sentoku
Also filed as: SENTOKU KOICHI
53 granted patents·13 pending applications·1,136 citations·filing 1991–2018
99Inventor score
Top patents by PatentIndex Score
66 records- 0193US7173716B2Alignment apparatus, exposure apparatus using the same, and method of manufacturing devicesCANON KK·Filed 2005·Granted Feb 6, 2007·15 cites·16 claims
- 0293US6421124B1Position detecting system and device manufacturing method using the sameCANON KK·Filed 1998·Granted Jul 16, 2002·106 cites·20 claims
- 0392US8845317B2Alignment method, imprint method, alignment apparatus, and position measurement methodSUEHIRA NOBUHITO·Filed 2007·Granted Sep 30, 2014·15 cites·9 claims
- 0492US7884935B2Pattern transfer apparatus, imprint apparatus, and pattern transfer methodCANON KK·Filed 2007·Granted Feb 8, 2011·12 cites·9 claims
- 0592US7148973B2Position detecting method and apparatus, exposure apparatus and device manufacturing methodCANON KK·Filed 2005·Granted Dec 12, 2006·12 cites·12 claims
- 0691US5625453ASystem and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction gratingCANON KK·Filed 1994·Granted Apr 29, 1997·93 cites·24 claims
- 0790US6559924B2Alignment method, alignment apparatus, profiler, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factoryCANON KK·Filed 2001·Granted May 6, 2003·37 cites·13 claims
- 0890US5553110AX-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure methodCANON KK·Filed 1994·Granted Sep 3, 1996·63 cites·15 claims
- 0990US5333050AMeasuring method and apparatus for meausring the positional relationship of first and second gratingsCANON KK·Filed 1991·Granted Jul 26, 1994·71 cites·16 claims
- 1089US5465148AApparatus and method for detecting the relative positional deviation between two diffraction gratingsCANON KK·Filed 1993·Granted Nov 7, 1995·59 cites·16 claims
- 1188US6992780B2Position detecting method and apparatus, exposure apparatus and device manufacturing methodCANON KK·Filed 2002·Granted Jan 31, 2006·26 cites·14 claims
- 1287US7385700B2Management system, apparatus, and method, exposure apparatus, and control method thereforCANON KK·Filed 2005·Granted Jun 10, 2008·8 cites·20 claims
- 1386US7771905B2Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing methodCANON KK·Filed 2006·Granted Aug 10, 2010·9 cites·6 claims
- 1486US5369486APosition detector for detecting the position of an object using a diffraction grating positioned at an angleCANON KK·Filed 1992·Granted Nov 29, 1994·51 cites·7 claims
- 1585US6992767B2Management system, apparatus, and method, exposure apparatus, and control method thereforCANON KK·Filed 2003·Granted Jan 31, 2006·21 cites·29 claims
- 1684US7247868B2Position detection method and apparatusCANON KK·Filed 2005·Granted Jul 24, 2007·6 cites·5 claims
- 1782US5610718AApparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizesCANON KK·Filed 1994·Granted Mar 11, 1997·40 cites·9 claims
- 1881US6101237AX-ray mask and X-ray exposure method using the sameCANON KK·Filed 1997·Granted Aug 8, 2000·45 cites·10 claims
- 1981US5432603AOptical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detectedCANON KK·Filed 1993·Granted Jul 11, 1995·36 cites·13 claims
- 2079US6785583B2Management system and apparatus, method therefor, and device manufacturing methodCANON KK·Filed 2003·Granted Aug 31, 2004·19 cites·28 claims
- 2175US8618515B2Lithography apparatus and device manufacturing methodSENTOKU KOICHI·Filed 2011·Granted Dec 31, 2013·3 cites·5 claims
- 2275US6154281APosition detecting system and device manufacturing method using the sameCANON KK·Filed 1997·Granted Nov 28, 2000·36 cites·10 claims
- 2375US5818588ADisplacement measuring method and apparatus using plural light beam beat frequency signalsCANON KK·Filed 1997·Granted Oct 6, 1998·33 cites·6 claims
- 2475US5751426APositional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same objectCANON KK·Filed 1995·Granted May 12, 1998·37 cites·14 claims
- 2575US5682239AApparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emittersCANON KK·Filed 1995·Granted Oct 28, 1997·37 cites·7 claims
- 2675US5585923AMethod and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting meansCANON KK·Filed 1994·Granted Dec 17, 1996·29 cites·7 claims
- 2774US8922774B2Method of manufacturing device, and substrateCANON KK·Filed 2012·Granted Dec 30, 2014·2 cites·10 claims
- 2874US7271882B2Shape measuring apparatus, shape measuring method, and aligning methodCANON KK·Filed 2005·Granted Sep 18, 2007·4 cites·4 claims
- 2974US6124922AExposure device and method for producing a mask for use in the deviceCANON KK·Filed 1997·Granted Sep 26, 2000·33 cites·16 claims
- 3072US8338805B2Reticle manufacturing method, surface shape measuring apparatus and signal processorSENTOKU KOICHI·Filed 2010·Granted Dec 25, 2012·2 cites·6 claims
- 3171US7531821B2Imprint apparatus and imprint method including dual movable image pick-up deviceCANON KK·Filed 2007·Granted May 12, 2009·8 cites·21 claims
- 3271US7110116B2Alignment apparatus, exposure apparatus using same, and method of manufacturing devicesCANON KK·Filed 2002·Granted Sep 19, 2006·9 cites·6 claims
- 3371US6636303B2Foreign substance inspecting method and apparatus, which detect a height of a foreign substance, and an exposure apparatus using this inspecting apparatusCANON KK·Filed 2001·Granted Oct 21, 2003·9 cites·13 claims
- 3470US9257262B2Lithography apparatus, lithography method, and method of manufacturing articleCANON KK·Filed 2014·Granted Feb 9, 2016·1 cites·17 claims
- 3567US5321502AMeasuring method and measuring apparatusCANON KK·Filed 1992·Granted Jun 14, 1994·25 cites·9 claims
- 3666US7952725B2Surface shape measurement apparatus and exposure apparatusCANON KK·Filed 2009·Granted May 31, 2011·2 cites·8 claims
- 3766US7586582B2Exposure apparatusCANON KK·Filed 2006·Granted Sep 8, 2009·2 cites·3 claims
- 3866US5847974AMeasuring method and apparatus for measuring system having measurement error changeable with timeCANON KK·Filed 1995·Granted Dec 8, 1998·24 cites·6 claims
- 3965US7075618B2Apparatus control system, apparatus control method, semiconductor exposure apparatus, semiconductor exposure apparatus control method and semiconductor device manufacturing methodCANON KK·Filed 2002·Granted Jul 11, 2006·9 cites·21 claims
- 4065US6529625B2Position detecting method and position detecting device for detecting relative positions of objects having position detecting marks by using separate reference member having alignment marksCANON KK·Filed 1998·Granted Mar 4, 2003·30 cites·28 claims
- 4162US7069104B2Management system, management apparatus, management method, and device manufacturing methodCANON KK·Filed 2003·Granted Jun 27, 2006·7 cites·12 claims
- 4262US5550635ARotational deviation detecting method and system using a periodic patternCANON KK·Filed 1994·Granted Aug 27, 1996·16 cites·27 claims
- 4359US7067826B2Position detection method and apparatusCANON KK·Filed 2002·Granted Jun 27, 2006·4 cites·15 claims
- 4457US5717492APosition detecting apparatus and a method for manufacturing semiconductor devices using the apparatusCANON KK·Filed 1997·Granted Feb 10, 1998·17 cites·19 claims
- 4555US8089612B2Position detection apparatus, position detection method, exposure apparatus, and device fabrication methodMATSUMOTO TAKAHIRO·Filed 2009·Granted Jan 3, 2012·2 cites·10 claims
- 4654US7373213B2Management system and apparatus, method therefor, and device manufacturing methodCANON KK·Filed 2004·Granted May 13, 2008·3 cites·10 claims
- 4753US6950179B2Shape measuring apparatus, shape measuring method, and aligning methodCANON KK·Filed 2002·Granted Sep 27, 2005·4 cites·10 claims
- 4852US2010002215A1Imaging optical system, exposure apparatus, and device manufacturing methodCANON KK·Filed 2009·Application pending·0 cites
- 4950US7123414B2Method for producing libraryCANON KK·Filed 2004·Granted Oct 17, 2006·2 cites·9 claims
- 5049US7010380B2Management system, management method and apparatus, and management apparatus control methodCANON KK·Filed 2003·Granted Mar 7, 2006·2 cites·16 claims
Showing the top 50 of 66 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →