Inventor · disambiguated record
Koki Yano
Also filed as: KAIJO AKIRA · TOMAI SHIGEKAZU · YANO KOKI
62 granted patents·23 pending applications·2,003 citations·filing 2005–2020
99Inventor score
Top patents by PatentIndex Score
85 records- 0199US8981369B2Field effect transistor using oxide semiconductor and method for manufacturing the sameIDEMITSU KOSAN CO·Filed 2013·Granted Mar 17, 2015·86 cites·7 claims
- 0299US8384077B2Field effect transistor using oxide semicondutor and method for manufacturing the sameIDEMITSU KOSAN CO·Filed 2008·Granted Feb 26, 2013·247 cites·12 claims
- 0398US8791457B2Oxide semiconductor field effect transistor and method for manufacturing the sameIDEMITSU KOSAN CO·Filed 2013·Granted Jul 29, 2014·52 cites·16 claims
- 0498US8723175B2Oxide semiconductor field effect transistor and method for manufacturing the sameIDEMITSU KOSAN CO·Filed 2013·Granted May 13, 2014·60 cites·14 claims
- 0598US8461583B2Oxide semiconductor field effect transistor and method for manufacturing the sameYANO KOKI·Filed 2008·Granted Jun 11, 2013·81 cites·17 claims
- 0698US8232552B2Noncrystalline oxide semiconductor thin film, process for producing the noncrystalline oxide semiconductor thin film, process for producing thin-film transistor, field-effect-transistor, light emitting device, display device, and sputtering targetYANO KOKI·Filed 2008·Granted Jul 31, 2012·135 cites·18 claims
- 0798US8158974B2Semiconductor device, polycrystalline semiconductor thin film, process for producing polycrystalline semiconductor thin film, field effect transistor, and process for producing field effect transistorYANO KOKI·Filed 2008·Granted Apr 17, 2012·114 cites·10 claims
- 0898US8030195B2TFT substrate and method for manufacturing TFT substrateIDEMITSU KOSAN CO·Filed 2010·Granted Oct 4, 2011·69 cites·17 claims
- 0998US7998372B2Semiconductor thin film, method for manufacturing the same, thin film transistor, and active-matrix-driven display panelIDEMITSU KOSAN CO·Filed 2006·Granted Aug 16, 2011·218 cites·18 claims
- 1097US8668849B2Sputtering target, oxide semiconductor film and semiconductor deviceINOUE KAZUYOSHI·Filed 2012·Granted Mar 11, 2014·32 cites·18 claims
- 1197US8642402B2Thin film transistor manufacturing method, thin film transistor, thin film transistor substrate and image display apparatus, image display apparatus and semiconductor deviceYANO KOKI·Filed 2008·Granted Feb 4, 2014·69 cites·32 claims
- 1297US8333913B2Sputtering target, oxide semiconductor film and semiconductor deviceINOUE KAZUYOSHI·Filed 2008·Granted Dec 18, 2012·54 cites·12 claims
- 1397US7982215B2TFT substrate and method for manufacturing TFT substrateIDEMITSU KOSAN CO·Filed 2006·Granted Jul 19, 2011·81 cites·38 claims
- 1497US7906777B2Semiconductor thin film and method for manufacturing same, and thin film transistorIDEMITSU KOSAN CO·Filed 2006·Granted Mar 15, 2011·58 cites·20 claims
- 1596US8778722B2TFT substrate and method for producing TFT substrateINOUE KAZUYOSHI·Filed 2011·Granted Jul 15, 2014·25 cites·26 claims
- 1696US8748879B2Semiconductor device, thin film transistor and a method for producing the sameYANO KOKI·Filed 2008·Granted Jun 10, 2014·74 cites·70 claims
- 1796US8455371B2Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistorYANO KOKI·Filed 2009·Granted Jun 4, 2013·33 cites·18 claims
- 1896US8153031B2In-Ga-Zn-Sn type oxide sinter and target for physical film depositionYANO KOKI·Filed 2007·Granted Apr 10, 2012·38 cites·18 claims
- 1995US9136338B2Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistorIDEMITSU KOSAN CO·Filed 2013·Granted Sep 15, 2015·15 cites·14 claims
- 2095US8129714B2Semiconductor, semiconductor device, complementary transistor circuit deviceYANO KOKI·Filed 2007·Granted Mar 6, 2012·29 cites·16 claims
- 2194US8795554B2Sputtering target for oxide semiconductor, comprising InGaO3(ZnO) crystal phase and process for producing the sputtering targetYANO KOKI·Filed 2009·Granted Aug 5, 2014·24 cites·17 claims
- 2294US8784700B2Sputtering target and oxide semiconductor filmINOUE KAZUYOSHI·Filed 2007·Granted Jul 22, 2014·22 cites·10 claims
- 2394US8779419B2Semiconductor device, polycrystalline semiconductor thin film, process for producing polycrystalline semiconductor thin film, field effect transistor, and process for producing field effect transistorYANO KOKI·Filed 2012·Granted Jul 15, 2014·79 cites·21 claims
- 2494US8530891B2Field-effect transistor, and process for producing field-effect transistorINOUE KAZUYOSHI·Filed 2008·Granted Sep 10, 2013·29 cites·39 claims
- 2594US8445903B2Thin film transistor having a crystalline semiconductor film including indium oxide which contains a hydrogen element and method for manufacturing sameINOUE KAZUYOSHI·Filed 2009·Granted May 21, 2013·30 cites·8 claims
- 2694US8263977B2TFT substrate and TFT substrate manufacturing methodINOUE KAZUYOSHI·Filed 2006·Granted Sep 11, 2012·31 cites·41 claims
- 2793US8753548B2Composite oxide sintered body and sputtering target comprising sameYANO KOKI·Filed 2009·Granted Jun 17, 2014·18 cites·7 claims
- 2893US8304359B2Sputtering target, transparent conductive film, and transparent electrode for touch panelYANO KOKI·Filed 2006·Granted Nov 6, 2012·33 cites·14 claims
- 2993US7648657B2In Sm oxide sputtering targetIDEMITSU KOSAN CO·Filed 2006·Granted Jan 19, 2010·18 cites·16 claims
- 3092US8704217B2Field effect transistor, semiconductor device and semiconductor device manufacturing methodYANO KOKI·Filed 2009·Granted Apr 22, 2014·24 cites·20 claims
- 3191US8871119B2Composite oxide sintered body and sputtering target comprising sameIDEMITSU KOSAN CO·Filed 2012·Granted Oct 28, 2014·9 cites·14 claims
- 3290US8598578B2Sputtering target and thin film transistor equipped with sameYANO KOKI·Filed 2010·Granted Dec 3, 2013·11 cites·9 claims
- 3390US8383019B2Sputtering target, transparent conductive film and transparent electrodeIDEMITSU KOSAN CO·Filed 2006·Granted Feb 26, 2013·8 cites·20 claims
- 3489US8641930B2In—Ga—Zn type oxide sputtering targetYANO KOKI·Filed 2010·Granted Feb 4, 2014·9 cites·20 claims
- 3589US8623511B2Sputtering target for oxide thin film and process for producing the sputtering targetKAWASHIMA HIROKAZU·Filed 2009·Granted Jan 7, 2014·17 cites·25 claims
- 3686US10833201B2Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atomsIDEMITSU KOSAN CO·Filed 2016·Granted Nov 10, 2020·3 cites·5 claims
- 3786US8641932B2Sintered complex oxide and sputtering target comprising sameYANO KOKI·Filed 2009·Granted Feb 4, 2014·8 cites·16 claims
- 3885US8709586B2Modified polyolefin resin for glass fiber treatment, surface-treated glass fiber, and fiber-reinforced polyolefin resinYANO KOKI·Filed 2005·Granted Apr 29, 2014·9 cites·12 claims
- 3984US8524123B2Sputtering target, transparent conductive film and transparent electrodeYANO KOKI·Filed 2006·Granted Sep 3, 2013·10 cites·15 claims
- 4083US8858844B2In—Ga—Zn—O type sputtering targetYANO KOKI·Filed 2010·Granted Oct 14, 2014·6 cites·20 claims
- 4179US10644163B2Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atomsYANO KOKI·Filed 2009·Granted May 5, 2020·4 cites·5 claims
- 4279US8785927B2Laminate structure including oxide semiconductor thin film layer, and thin film transistorEBATA KAZUAKI·Filed 2011·Granted Jul 22, 2014·5 cites·6 claims
- 4379US8647537B2Oxide sintered body and sputtering targetUTSUNO FUTOSHI·Filed 2009·Granted Feb 11, 2014·7 cites·11 claims
- 4477US9202603B2Sputtering target, transparent conductive film and transparent electrodeIDEMITSU KOSAN CO·Filed 2012·Granted Dec 1, 2015·2 cites·14 claims
- 4576US8920683B2Sputtering target, transparent conductive film and transparent electrodeIDEMITSU KOSAN CO·Filed 2012·Granted Dec 30, 2014·2 cites·20 claims
- 4676US8012283B2Method for producing fiber-reinforced resin compositionPRIME POLYMER CO LTD·Filed 2005·Granted Sep 6, 2011·4 cites·13 claims
- 4769US8784699B2In-Ga-Zn-type oxide, oxide sintered body, and sputtering targetYANO KOKI·Filed 2010·Granted Jul 22, 2014·2 cites·11 claims
- 4866US9209257B2Oxide sintered body and sputtering targetIDEMITSU KOSAN CO·Filed 2013·Granted Dec 8, 2015·1 cites·13 claims
- 4965US9214519B2In2O3—SnO2—ZnO sputtering targetITOSE MASAYUKI·Filed 2012·Granted Dec 15, 2015·2 cites·8 claims
- 5065US8637124B2Oxide material and sputtering targetYANO KOKI·Filed 2006·Granted Jan 28, 2014·1 cites·13 claims
Showing the top 50 of 85 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Koki Yano files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →